Electron dynamics in low pressure capacitively coupled radio frequency discharges
In low temperature plasmas, the interaction of the electrons with the electric field is an
important current research topic that is relevant for many applications. Particularly, in the low …
important current research topic that is relevant for many applications. Particularly, in the low …
Multiscale modeling of plasma–surface interaction—General picture and a case study of Si and SiO2 etching by fluorocarbon-based plasmas
P Vanraes, S Parayil Venugopalan… - Applied Physics …, 2021 - pubs.aip.org
The physics and chemistry of plasma–surface interaction is a broad domain relevant to
various applications and several natural processes, including plasma etching for …
various applications and several natural processes, including plasma etching for …
eduPIC: an introductory particle based code for radio-frequency plasma simulation
Particle based simulations are indispensable tools for numerical studies of charged particle
swarms and low-temperature plasma sources. The main advantage of such approaches is …
swarms and low-temperature plasma sources. The main advantage of such approaches is …
The role of electron induced secondary electron emission from SiO2 surfaces in capacitively coupled radio frequency plasmas operated at low pressures
The effects of electron induced secondary electron (SE) emission from SiO 2 electrodes in
single-frequency capacitively coupled plasmas (CCPs) are studied by particle-in-cell/Monte …
single-frequency capacitively coupled plasmas (CCPs) are studied by particle-in-cell/Monte …
The effect of electron induced secondary electrons on the characteristics of low-pressure capacitively coupled radio frequency plasmas
We investigate the effects of secondary electrons (SEs), induced by electrons impinging on
the electrodes, on the characteristics of low-pressure single-frequency capacitively coupled …
the electrodes, on the characteristics of low-pressure single-frequency capacitively coupled …
Electron dynamics in radio frequency magnetron sputtering argon discharges with a dielectric target
We demonstrate a self-consistent and complete description of electron dynamics in a typical
electropositive radio frequency magnetron sputtering (RFMS) argon discharge with a …
electropositive radio frequency magnetron sputtering (RFMS) argon discharge with a …
High-energy ballistic electrons in low-pressure radio-frequency plasmas
This work demonstrates the presence of a small number of high-energy ballistic electrons
(HEBEs) that originate from secondary electrons in low-pressure radio-frequency (rf) …
(HEBEs) that originate from secondary electrons in low-pressure radio-frequency (rf) …
2D particle-in-cell simulations of geometrically asymmetric low-pressure capacitive RF plasmas driven by tailored voltage waveforms
The effects of the simultaneous presence of two different types of plasma asymmetry, viz,
geometric and electrical, on low-pressure capacitively coupled argon discharges are studied …
geometric and electrical, on low-pressure capacitively coupled argon discharges are studied …
Charged particle dynamics and distribution functions in low pressure dual-frequency capacitively coupled plasmas operated at low frequencies and high voltages
P Hartmann, L Wang, K Nösges, B Berger… - Plasma Sources …, 2020 - iopscience.iop.org
In high aspect ratio (HAR) dielectric plasma etching, dual-frequency capacitively coupled
radio-frequency plasmas operated at low pressures of 1 Pa or less are used. Such plasma …
radio-frequency plasmas operated at low pressures of 1 Pa or less are used. Such plasma …
Similarity law and frequency scaling in low-pressure capacitive radio frequency plasmas
We verify the similarity law (SL) and show a violation of frequency scaling (f-scaling) in low-
pressure capacitive radio frequency (rf) plasmas via fully kinetic particle-in-cell simulations …
pressure capacitive radio frequency (rf) plasmas via fully kinetic particle-in-cell simulations …