This review paper gives an overview of recent developments in nanoparticle research and
semiconductor industry applications. Nanoparticles have become useful building blocks for …

With the development of microelectronics, the demand for continuously miniaturized feature
sizes has driven continuous progress in lithography technology. Extreme ultraviolet (EUV) …

Zeolitic imidazolate frameworks (ZIFs) are a subset of metal–organic frameworks with more
than 200 characterized crystalline and amorphous networks made of divalent transition …

The need for decreasing semiconductor device critical dimensions at feature sizes below the
20 nm resolution limit has led the semiconductor industry to adopt extreme ultra violet (EUV) …

This report describes recent developments and current needs in the field of high-resolution
photopolymers and photomolecules briefly describing prior generation lithographic …

Rigorously designed sub-micrometer structure arrays are widely used in metasurfaces for
light modulation. One of the glaring restrictions is the unavailability of easily accessible …

The resolution, line edge roughness, and sensitivity (RLS) trade-off has fundamentally
limited the lithographic performance of chemically amplified resists. Production of next …

Sub-10 nm patterning with extreme ultraviolet (EUV) light is receiving immediate attention as
a next-generation nanolithography technique, but photoresist materials optimized to EUV …

This review provides a general overview of different biosensors, mostly concentrating on
electrochemical analytical devices, while briefly explaining general approaches to various …

Nonchemically amplified resists based on triphenyl sulfonium triflate-modified polystyrene
(PSTS) were prepared by a facile method of modification of polystyrene with sulfonium …