Computational thermodynamic study on CVD of silicon oxynitride films from Si–O–N–H and Si–O–N–H–Cl systems
W Huang, J Wang, Q Xu, M Yang, K Liu, J Peng… - Ceramics …, 2024 - Elsevier
High-throughput thermodynamic analysis of chemical vapor deposition of silicon oxynitride
films from the Si–O–N–H and Si–O–N–H–Cl systems are performed based on the …
films from the Si–O–N–H and Si–O–N–H–Cl systems are performed based on the …
Preparation and properties of porous silicon nitride ceramics with uniform spherical pores by improved pore-forming agent method
J Zhou, J Fan, G Sun, J Zhang, X Liu, D Zhang… - Journal of Alloys and …, 2015 - Elsevier
Microsphere powder containing monodisperse polymethylmethacrylate (PMMA)
microspheres and Si 3 N 4 particles was prepared by spray-dried method. The …
microspheres and Si 3 N 4 particles was prepared by spray-dried method. The …
In situ synthesis of Si2N2O/Si3N4 composite ceramics using polysilyloxycarbodiimide precursors
H Cheng, Y Li, E Kroke, S Herkenhoff - Journal of the European Ceramic …, 2013 - Elsevier
In situ synthesis of Si2N2O/Si3N4 composite ceramics was conducted via thermolysis of
novel polysilyloxycarbodiimide ([SiOSi (NCN) 3] n) precursors between 1000 and 1500° C in …
novel polysilyloxycarbodiimide ([SiOSi (NCN) 3] n) precursors between 1000 and 1500° C in …
Catalytic nitridation preparation of high-performance Si3N4 (w)-SiC composite using Fe2O3 nano-particle catalyst: Experimental and DFT studies
J Liu, Y Gu, F Li, L Lu, H Zhang, S Zhang - Journal of the European Ceramic …, 2017 - Elsevier
The complete conversion from Si into Si 3 N 4 was achieved after 2 h nitridation at 1400° C
by using in-situ formed Fe 2 O 3 nano-particles (NPs) as a catalyst. Such a synthesis …
by using in-situ formed Fe 2 O 3 nano-particles (NPs) as a catalyst. Such a synthesis …
Fabrication of Si3N4 reticulated porous ceramics reinforced by needle-like β-Si3N4
H Yue, X Wang, J Tian - Ceramics International, 2014 - Elsevier
Si 3 N 4 reticulated porous ceramics (RPC) were prepared by twice-sintering and replication
techniques. The α-Si 3 N 4 and Si powder in raw materials were partially transformed into …
techniques. The α-Si 3 N 4 and Si powder in raw materials were partially transformed into …
Silicon oxycarbide and silicon oxycarbonitride materials under concentrated solar radiation
The potential application of silicon oxycarbonitride (SiOCN), silicon oxycarbide (SiOC) and
silicon oxycarbide–SiC (SiOC–SiC) for photothermal devices such as volumetric solar …
silicon oxycarbide–SiC (SiOC–SiC) for photothermal devices such as volumetric solar …
Thermoluminescent composites of sintered synthetic-topaz/in situ corundum for dosimetry by a novel reversible process
SA Sinclair, MI Pech-Canul, MC Acosta-Enríquez… - Heliyon, 2024 - cell.com
Abstract Topaz (Al 2 F 1· 44 (OH) 0· 56 SiO 4)/corundum (Al 2 O 3) composites were
prepared by a facile and novel reversible process from the sintering of synthetic topaz and …
prepared by a facile and novel reversible process from the sintering of synthetic topaz and …
Size dependence of optical and mechanical properties of Si 3 N 4 nanobelts controlled by flow rates
S Dong, P Hu, X Zhang, Y Cheng, D Zhang… - Journal of Materials …, 2016 - pubs.rsc.org
Single-crystalline Si3N4 nanobelts (NBs) were successfully synthesized in a size-controlled
manner using graphite, nanosilicon and nanosilica powders in N2 gas. The average width of …
manner using graphite, nanosilicon and nanosilica powders in N2 gas. The average width of …
Kinetics of Silicon Nitride Formation on SiO2‐Derived Rice Husk Ash Using the Chemical Vapor Infiltration Method
Since silicon nitride coatings on silicon dioxide are attractive for the semiconductor and
electronics industries, cognizance of their formation kinetics is crucial for optimization of …
electronics industries, cognizance of their formation kinetics is crucial for optimization of …
Characterisation of amorphous/nanocrystalline multilayer Si3N4–Si3N4/Si2N2O films prepared by alternately sputtering
E Liu, J Pu, Z Zeng, Y Wang, W Zhao - Surface Engineering, 2017 - journals.sagepub.com
By using direct current (DC) and radio frequency (RF) co-sputtering deposition, multilayer
Si3N4 films composed of alternately DC layer and RF layer were prepared. Phase …
Si3N4 films composed of alternately DC layer and RF layer were prepared. Phase …