Reducing plasma shielding effect for improved nanosecond laser drilling of copper with applied direct current
J Li, W Zhang, H Zheng, J Gao, C Jiang - Optics & Laser Technology, 2023 - Elsevier
Laser drilling of copper faces challenges due to its high reflectivity and high thermal
conductivity of the laser beam. To enhance laser drilling efficiency and hole surface quality …
conductivity of the laser beam. To enhance laser drilling efficiency and hole surface quality …
Recent progress of experimental fluid mechanics for EUV sources
D Weiwei, Z Tianqi, GAO Lihao, XU Chenghao… - 力学进展, 2024 - lxjz.cstam.org.cn
The extreme ultraviolet (EUV) source is the enabling component of the EUV lithography. The
commercialized EUV source is based on laser produced plasma from tin droplet target. EUV …
commercialized EUV source is based on laser produced plasma from tin droplet target. EUV …
An experimental investigation of the dynamic response of a liquid metal jet subjected to nanosecond laser ablation
T Zhai, C Xu, Q Chen, L Gao, Z Zhang, C Xu, Y Zhao… - Physics of …, 2024 - pubs.aip.org
The dynamic response of a micrometer-sized gallium–indium (Ga-In) jet in nitrogen
subjected to intense Neodymium-doped Yttrium Aluminum Garnet (Nd: YAG) laser pulses …
subjected to intense Neodymium-doped Yttrium Aluminum Garnet (Nd: YAG) laser pulses …
[HTML][HTML] 面向EUV 光源的实验流体力学研究进展
邓巍巍， 翟天琪， 高立豪， 许晟昊， 赵新彦， 刘艳初 - 力学进展, 2024 - lxjz.cstam.org.cn
EUV (极紫外) 光源是EUV 光刻机的核心部件, 其原理是基于纳秒脉冲激光轰击锡液滴靶产生的
等离子体辐射发光. EUV 光源本质是一种流体光源, 涉及丰富而复杂的流体力学基本问题 …
等离子体辐射发光. EUV 光源本质是一种流体光源, 涉及丰富而复杂的流体力学基本问题 …