Magnetron sputtering is a plasma-based Physical Vapor Deposition technique for synthesis
of surface coatings. In the present survey, we have summarized and discussed in detail both …

TiAlN single layer coatings deposited by High-Power Impulse Magnetron Sputtering
(HiPIMS) on carbide and Si-wafers substrates were performed. They were characterized in …

The present study aims to demonstrate that operating the HiPIMS discharge in bipolar
regime (BP-HiPIMS) enables an energy-enhanced deposition process of high-quality …

Dual-phase high entropy alloys have been proved to have the ability to overcome the
strength-ductility trade-off. However, high-entropy alloy films are difficult to obtain a dual …

High power impulse magnetron sputtering (HiPIMS) is an ionized physical vapour
deposition technique. While HiPIMS provides a high flux of metal ions to the substrate, the …

The quality of coatings deposited by magnetron sputtering is known to depend on, among
others, the magnetic field strength (Φ) and the magnetic field configuration. Furthermore …

Despite the tremendous potential for industrial use of tungsten (W), very few studies have
been reported so far on controlling and tailoring the properties of W thin films obtained by …

In high power impulse magnetron sputtering (HiPIMS) process, the magnetic field and
unbalance degree and pulsing configuration are key factors in controlling metal ionization …

High power impulse magnetron sputtering (HiPIMS) is an ionized physical vapor deposition
technique, providing a high flux of metal ions to the substrate. However, one of the …

Amorphous Si–C-based (a-SiC) thin films as protective coating have been attracting more
and more attentions. But there are contradictory reports in the literature about the effect of …