In recent years, the explosive development of artificial intelligence implementing by artificial neural networks (ANNs) creates inconceivable demands for computing hardware. However …
D Kazazis, JG Santaclara, J van Schoot… - Nature Reviews …, 2024 - nature.com
Extreme ultraviolet lithography (EUVL) was recently adopted by the semiconductor industry as the leading-edge lithography technique for continued miniaturization of semiconductor …
Atomically precise hydrogen desorption lithography using scanning tunnelling microscopy (STM) has enabled the development of single-atom, quantum-electronic devices on a …
Grayscale structured surfaces with nanometer-scale features are used in a growing number of applications in optics and fluidics. Thermal scanning probe lithography achieves a lateral …
Cells sense and respond to a variety of physical cues from their surrounding microenvironment, and these are interpreted through mechanotransductive processes to …
Many areas of modern materials chemistry, from nanoscale electronics to regenerative medicine, require design of precisely-controlled chemical environments at near-molecular …
J Noh, J Ha, D Kim - Applied Surface Science, 2020 - Elsevier
Pulsed-laser sintering of metal nanoparticles on flexible substrates has attracted increasing attention owing to its potential in direct printing of high-resolution patterns or fabricating …
Y Zhang, J Haitjema, X Liu… - Journal of Micro …, 2017 - spiedigitallibrary.org
Molecular inorganic materials are currently considered photoresists for extreme ultraviolet lithography (EUVL). Their high EUV absorption cross section and small building block size …
N Ravi Kiran, M Chauhan, SK Sharma… - ACS Applied …, 2020 - ACS Publications
Since the fabrication of micro-/nanoelectronic devices are marching toward ultralow node technology with dense patterns to meet the current industry demands, continuous …