The success of advanced quantum communication relies crucially on non-classical light
sources emitting single indistinguishable photons at high flux rates and purity. We report on …

The performance of a deterministic lithographic technology to produce a reliable and
accurate fabrication of nanophotonic devices based on epitaxial quantum dots is analyzed …

The application of solid-state quantum emitters in real-world quantum information
technologies requires precise nanofabrication platforms with high process yield. Self …

We report on an advanced in-situ electron-beam lithography technique based on high-
resolution cathodoluminescence (CL) spectroscopy at low temperatures. The technique has …

We report on a 3D electron beam lithography (EBL) technique using polymethyl
methacrylate (PMMA) in the negative-tone regime as a resist. First, we briefly demonstrate …

Scanning transmission X-ray microscopy (STXM) was used to study chemical changes to
perfluorosulfonic acid (PFSA) spun cast thin films as a function of dose imparted by …

The temperature dependence of the electron-beam sensitive resist CSAR 62 is investigated
in its negative-tone regime. The writing temperatures span a wide range from 4 K to room …

We report on enhancing the photon-extraction efficiency (PEE) of deterministic quantum dot
(QD) microlenses via anti-reflection (AR) coating. The AR-coating deposited on top of the …

Photonic quantum technologies are based on the exchange of information via single
photons. The information is typically encoded in the polarization of the photons and security …

This chapter addresses the design, fabrication and characterization of deterministically
fabricated single-photon sources based on quantum dot microlenses. The quantum devices …