Helicon high-density (up to~ 1013 cm− 3) plasma sources using a radio frequency wave in
the presence of a magnetic field under a low pressure are very promising for various …

Written by a leading expert in the field, the paperback edition of Industrial Plasma
Engineering, Volume 2: Applications to Nonthermal Plasma Processing provides a …

First observed in gaseous plasmas in the early 1960s, helicon discharges lay like a sleeping
giant until they emerged in the 1980s, when their usefulness as efficient plasma sources for …

Vector‐rf‐B‐field measurements in the near‐field of a helicon plasma source taken
throughout the volume of the source are reported. Three distinct modes of operation of the …

In this review paper, general wave characteristics and plasma production through excitation
by propagating waves are outlined, with emphasis on plasma processing. First, the basic …

We report on the development of unique, high-density helicon plasma sources and describe
their applications. Characterization of one of the largest helicon plasma sources yet …

We have developed a very large volume, high-density helicon plasma source, 75 cm in
diameter and 486 cm in axial length; full width at half maximum of the plasma density is up …

Low magnetic field density peak (LFP) is a typical nonlinear phenomenon in helicon wave
discharge, which is characterized by the nonlinear increase in electron density with the …

The ability to deposit power in the volume of plasma reactors at locations deeper than the
conventional skin depth makes magnetically enhanced inductively coupled plasma (MEICP) …

A brief review is presented of the application of plasma-aided manufacturing to
semiconductor fabrication. Emphasis is placed on current state-of-the-art techniques for …