Multiscale CFD modeling of area-selective atomic layer deposition: Application to reactor design and operating condition calculation
Area-selective atomic layer deposition (ASALD) as a bottom-up nanopatterning technique
has gained recognition for its ability to address misalignment issues in semiconductor …
has gained recognition for its ability to address misalignment issues in semiconductor …
Characterization of alane (AlH3) thin films grown by atomic layer deposition for hydrogen storage applications
S Okasha, TP Almeida - Applied Surface Science, 2024 - Elsevier
Alane (AlH 3) is an increasingly favored material for hydrogen and energy storage. It has
demonstrated its potential in various applications, including rocket fuel, explosives, reducing …
demonstrated its potential in various applications, including rocket fuel, explosives, reducing …
[PDF][PDF] ATOMIC LAYER DEPOSITION OF NANOSCALE ALUMINUM SUPERCONDUCTING MATERIAL
サーメー,アハメドオカシャ - 2024 - catalog.lib.kyushu-u.ac.jp
Atomic Layer Deposition (ALD) is a thin-film deposition technique that allows the growth of
conformal, uniform, and precise layers of materials on substrates. ALD is often used in the …
conformal, uniform, and precise layers of materials on substrates. ALD is often used in the …