There is an astonishing number of optoelectronic, photonic, biological, sensing, or storage
media devices, just to name a few, that rely on a variety of extraordinary periodic surface …

Molecular self-assembling block copolymers (BCPs) have shown promise as a next
generation bottom-up lithography technology. However, a critical step in advancing this …

Block copolymers (BCPs) are known to self-assemble into various structures. In particular,
crystallization-driven self-assembly (CDSA) strategies revealed a high potential for …

Next‐generation lithography techniques based on the self‐assembly of block copolymers
(BCPs) are promising methods for high‐resolution pattering. BCPs with a high …

Graphene presents a real need for patterning into very narrow nanostructures to open up a
band gap and tune its electrical properties by quantum confinement. A self-assembled …

A promising alternative for the next-generation lithography is based on the directed self-
assembly of block copolymers (BCPs) used as a bottom-up tool for the definition of …

We propose a thin, single-layered circular dichroic filter with Au nanospiral structures on a
polydimethylsiloxane (PDMS) thin film that has strong circular dichroism at visible …

Block copolymers (BCPs) in the bulk state are known to self‐assemble into different
morphologies depending on their polymer segment ratio. For polymers with amorphous and …

We demonstrated a simple and effective approach to fabricate dense and high aspect ratio
sub-50 nm pillars based on phase separation of a polymer blend composed of a cross …

Solvents with a wide range of polarities, including poly (dimethylsiloxane) and oligo
(dimethylsiloxane), were used to evaluate aromatic donor–acceptor interactions between …