Large circuit models: opportunities and challenges
Within the electronic design automation (EDA) domain, artificial intelligence (AI)-driven
solutions have emerged as formidable tools, yet they typically augment rather than redefine …
solutions have emerged as formidable tools, yet they typically augment rather than redefine …
Lithobench: Benchmarking ai computational lithography for semiconductor manufacturing
Computational lithography provides algorithmic and mathematical support for resolution
enhancement in optical lithography, which is the critical step in semiconductor …
enhancement in optical lithography, which is the critical step in semiconductor …
L2o-ilt: Learning to optimize inverse lithography techniques
Inverse lithography technique (ILT) is one of the most widely used resolution enhancement
techniques (RETs) to compensate for the diffraction effect in the lithography process …
techniques (RETs) to compensate for the diffraction effect in the lithography process …
Hotspot detection via attention-based deep layout metric learning
With the aggressive and amazing scaling of the feature size of semiconductors, hotspot
detection has become a crucial and challenging problem in the generation of optimized …
detection has become a crucial and challenging problem in the generation of optimized …
AdaOPC: A self-adaptive mask optimization framework for real design patterns
Optical proximity correction (OPC) is a widely-used resolution enhancement technique
(RET) for printability optimization. Recently, rigorous numerical optimization and fast …
(RET) for printability optimization. Recently, rigorous numerical optimization and fast …
The dawn of ai-native eda: Promises and challenges of large circuit models
Within the Electronic Design Automation (EDA) domain, AI-driven solutions have emerged
as formidable tools, yet they typically augment rather than redefine existing methodologies …
as formidable tools, yet they typically augment rather than redefine existing methodologies …
Efficient ilt via multi-level lithography simulation
Inverse Lithography Technology (ILT) is a widely investigated method to improve the yield of
chip manufacturing. However, high computational complexity and difficulty in fabricating …
chip manufacturing. However, high computational complexity and difficulty in fabricating …
A2-ILT: GPU accelerated ILT with spatial attention mechanism
Inverse lithography technology (ILT) is one of the promising resolution enhancement
techniques (RETs) in modern design-for-manufacturing closure, however, it suffers from …
techniques (RETs) in modern design-for-manufacturing closure, however, it suffers from …
AnalogCoder: Analog Circuit Design via Training-Free Code Generation
Analog circuit design is a significant task in modern chip technology, focusing on the
selection of component types, connectivity, and parameters to ensure proper circuit …
selection of component types, connectivity, and parameters to ensure proper circuit …
Ultra-fast source mask optimization via conditional discrete diffusion
Source mask optimization (SMO) is vital for mitigating lithography imaging distortions
caused by shrinking critical dimensions in integrated circuit fabrication. However, the …
caused by shrinking critical dimensions in integrated circuit fabrication. However, the …