Multi-element CrTaNbMoV nitride films are prepared using direct current magnetron
sputtering CrTaNbMoV mosaic alloy target at various N 2/(Ar+ N 2) flow ratios (RN). The …

In this study, tantalum nitride (TaN) thin films were deposited on Si (100) and 316L stainless
steel (SS) substrates by reactive DC magnetron sputtering. The effect of the nitrogen fraction …

Nitrogen (and also oxygen) determination has become an important parameter to
characterize (oxy) nitride materials for many properties and applications. Analyzing such …

Improving the hardness of amorphous carbon nitride with tantalum was realized by using ion
beam assisted filtered arc deposition to obtain a low friction coefficient and low specific wear …

Ferroelectric phase stability in hafnium oxide is reported to be influenced by factors that
include composition, biaxial stress, crystallite size, and oxygen vacancies. In the present …

Tantalum oxynitride thin films have been deposited by reactive magnetron sputtering, using
a fixed proportion reactive gas mixture (85% N2+ 15% O2). To produce the films, the partial …

ZrN-based coatings have attracted significant attention due to their high hardness and
outstanding thermal properties. In this research, ZrN, TaN, and (Zr, Ta) N coatings with …

Nanocrystalline tantalum nitride (TaN) thin films have been deposited by reactive direct
current magnetron sputtering technique on Si/SiO2 (100) substrate with nitrogen flow rate …

Rapid advancements in industrial technology necessitate mechanical parts capable of
operating at high temperatures. High entropy alloy films have emerged as promising …

The study aims to advance the applicability of titanium alloys as bone implant materials by
tackling some important aspects of surface robustness and bioactivity. To do so, biologically …