A comprehensive review of recent progress on GaN high electron mobility transistors: Devices, fabrication and reliability

F Zeng, JX An, G Zhou, W Li, H Wang, T Duan, L Jiang… - Electronics, 2018 - mdpi.com
GaN based high electron mobility transistors (HEMTs) have demonstrated extraordinary
features in the applications of high power and high frequency devices. In this paper, we …

A brief overview of the rapid progress and proposed improvements in gallium nitride epitaxy and process for third-generation semiconductors with wide bandgap

AC Liu, YY Lai, HC Chen, AP Chiu, HC Kuo - Micromachines, 2023 - mdpi.com
In this paper, we will discuss the rapid progress of third-generation semiconductors with
wide bandgap, with a special focus on the gallium nitride (GaN) on silicon (Si). This …

Sensitivity analysis of Al0. 3Ga0. 7N/GaN dielectric modulated MOSHEMT biosensor

A Dastidar, TK Patra, SK Mohapatra… - ECS Journal of Solid …, 2023 - iopscience.iop.org
Emerging and newly proposed devices integrate various materials at different scales (from
nano to submicron), which reveals sensor response. Prefab simulation is in great demand to …

Abnormal on current tendency in saturation region between high and light carbon doped buffer layer in p-GaN HEMT

CH Yeh, PH Chen, TC Chang… - IEEE Electron …, 2023 - ieeexplore.ieee.org
To reduce drain leakage current, carbon doping is introduced in the GaN layer of the p-GaN
HEMT device. The focus of this study is on the discussion of the abnormal current behavior …

Low trap density of oxygen-rich HfO2/GaN interface for GaN MIS-HEMT applications

WC Cheng, J He, M He, Z Qiao, Y Jiang, F Du… - Journal of Vacuum …, 2022 - pubs.aip.org
The high-k nature of HfO 2 makes it a competitive gate oxide for various GaN-based power
devices, but the high trap densities at the HfO 2/GaN interface have hindered the …

Sensing metrics of a dual-cavity single-gate MOSHEMT

A Dastidar, TK Patra, SK Mohapatra, M Braim… - Journal of the Korean …, 2023 - Springer
This paper presents the simulation study of the impact of dielectric modulation on the
characteristics of a single-gate single-cavity and a single-gate dual-cavity AlGaN/GaN …

Improved drain lag by reduced surface current in GaN HEMT via an ultrathin HfO2 blanket layer

B Güneş, A Ghobadi, O Odabasi… - Semiconductor …, 2023 - iopscience.iop.org
This paper reports the influence of an ultrathin 1.5 nm atomic-layer-deposited HfO 2 blanket
layer as a gate dielectric on GaN high-electron-mobility transistors (HEMTs) grown on a 4H …

Sensitivity estimation of biosensor in a tapered cavity MOSHEMT

A Dastidar, TK Patra, SK Mohapatra, KP Pradhan… - Physica …, 2024 - iopscience.iop.org
The present research provides a comprehensive investigation of the structural modification
at the cavity under the gate (CUG) on the metal oxide semiconductor high electron mobility …

Design of a single gate metal oxide semiconductor high electron mobility transistor with a cavity under the gate

A Dastidar, TK Patra - 2021 IEEE International Women in …, 2021 - ieeexplore.ieee.org
This paper presents the impact of dielectric modulation on characteristics for an AlGaN/GaN
heterostructure using 2D Visual TCAD simulation. The paper presents the simulation of a …

[PDF][PDF] Investigation of the Electrical Characteristics of AlGaN/AlN/GaN Heterostructure MOS-HEMTs with TiO2 High-k Gate Insulator

D Bouguenna, A Beloufa, K Hebali… - Int. J. Nanoelectron …, 2023 - ijneam.unimap.edu.my
This paper investigates the impact of TiO2 high-k gate insulator on the electrical
characteristics of AlGaN/AlN/GaN MOS-HEMT transistors using MATLAB and Atlas-TCAD …