Resists that enable high-throughput and high-resolution patterning are essential in driving
the semiconductor technology forward. The ultimate patterning performance of a resist in …

As the semiconductor industry continues to push the limits of integrated circuit fabrication,
reliance on extreme ultraviolet lithography (EUVL) has increased. Additionally, it has …

One of the key steps in the pattern formation chain of extreme ultraviolet (EUV) lithography is
the development process to resolve the resist pattern after EUV exposure. A simple …

In this study, we evaluated the impact of a new development method ESPERT™ on tight
pitch contact holes patterns fabricated by extreme ultraviolet (EUV) and e-beam (EB) …

▪ New development method called ESPERTTM was confirmed to be effective for improving
Metal Oxide Resist (MOR) fine patterning with high resolution, reduced EUV exposure dose …

One of the key steps in the pattern formation chain of extreme ultraviolet (EUV) lithography is
the development process to resolve the resist pattern after EUV exposure. The traditional …