In this topical review we catagorise all ambient pressure x-ray photoelectron spectroscopy
publications that have appeared between the 1970s and the end of 2018 according to their …

Carbon dioxide (CO2) is one of the end products of fuel combustion and the major
component of the greenhouse gases. The reduction of atmospheric CO2 not only decreases …

Atomic-scale precision alignment is a bottleneck in the fabrication of next-generation
nanoelectronics. In this study, a redox-coupled inherently selective atomic layer deposition …

Resistive random access memory (RRAM) technologies based on non-volatile resistive
filament redox switching oxides have the potential of drastically improving the performance …

In-memory computing can be used to overcome the von Neumann bottleneck—the need to
shuffle data between separate memory and computational units—and help improve …

The surface chemistry of the initial growth during the first or first few precursor cycles in
atomic layer deposition is decisive for how the growth proceeds later on and thus for the …

Iron, cobalt, and nickel chalcogenides are a class of fascinating materials, which have many
applications in cutting-edge technologies. Atomic layer deposition (ALD) is a highly useful …

The use of protective barriers to isolate a metal surface from an aggressive environment is a
common way to inhibit its degradation. We used ambient pressure x-ray photoelectron …

Hole storage layer (HSL) has been proved to be effective for constructing highly efficient
photoelectrochemical (PEC) systems owing to its timely extraction and temporary storage of …

Atomic layer processing such as atomic layer deposition (ALD) and thermal atomic layer
etching (ALE) is usually described in terms of sequential, self-limiting surface reactions. This …