Nanoscale materials patterning and engineering by atomic force microscopy nanolithography
This review article aims to provide an updated and comprehensive description on the
development of atomic force microscopy (AFM) nanolithography for structuring and …
development of atomic force microscopy (AFM) nanolithography for structuring and …
Atomic and close-to-atomic scale manufacturing: a review on atomic layer removal methods using atomic force microscopy
Manufacturing at the atomic scale is the next generation of the industrial revolution. Atomic
and close-to-atomic scale manufacturing (ACSM) helps to achieve this. Atomic force …
and close-to-atomic scale manufacturing (ACSM) helps to achieve this. Atomic force …
Nano-oxidation of silicon surfaces: Comparison of noncontact and contact atomic-force microscopy methods
M Tello, R Garcı́a - Applied Physics Letters, 2001 - pubs.aip.org
Local oxidation lithography by atomic-force microscopy is emerging as a powerful method
for nanometer-scale patterning of surfaces. Here, we perform a comparative study of contact …
for nanometer-scale patterning of surfaces. Here, we perform a comparative study of contact …
Recent progress of nano-technology with NSOM
JH Kim, KB Song - Micron, 2007 - Elsevier
Recent progress of nano-technology with near-field scanning optical microscope (NSOM) is
surveyed in this article. We focus mainly on NSOM, nano-scale spectroscopy with NSOM …
surveyed in this article. We focus mainly on NSOM, nano-scale spectroscopy with NSOM …
Nanoscale reduction of graphene oxide under ambient conditions
AC Faucett, JM Mativetsky - Carbon, 2015 - Elsevier
Localized voltage-induced reduction, initiated by a conductive atomic force microscope
probe under ambient conditions, is used to pattern electrically conductive reduced graphene …
probe under ambient conditions, is used to pattern electrically conductive reduced graphene …
Nanolithography on thin layers of PMMA using atomic force microscopy
A new technique for producing nanometre scale patterns on thin layers (< 30 nm thick) of
PMMA on silicon is described. The method consists of inducing the local modification of the …
PMMA on silicon is described. The method consists of inducing the local modification of the …
Current, charge, and capacitance during scanning probe oxidation of silicon. I. Maximum charge density and lateral diffusion
JA Dagata, F Perez-Murano, C Martin… - Journal of applied …, 2004 - pubs.aip.org
A comprehensive analysis of the electrical current passing through the tip-substrate junction
during oxidation of silicon by scanning probe microscopy (SPM) is presented. This analysis …
during oxidation of silicon by scanning probe microscopy (SPM) is presented. This analysis …
Parallel writing by local oxidation nanolithography with submicrometer resolution
We demonstrate that the process of local oxidation of surfaces by atomic force microscopy
(AFM) can be upscaled in a straightforward way by using a solid support with multiple …
(AFM) can be upscaled in a straightforward way by using a solid support with multiple …
Electron tunneling characteristics on La0. 7Sr0. 3MnO3 thin-film surfaces at high temperature
We report on the electron tunneling characteristics on La 0.7 Sr 0.3 MnO 3 (LSM) thin-film
surfaces up to 580 C in 10− 3 mbar oxygen pressure, using scanning tunneling microscopy …
surfaces up to 580 C in 10− 3 mbar oxygen pressure, using scanning tunneling microscopy …
Sub-10 nm patterning of few-layer MoS2 and MoSe2 nanolectronic devices by oxidation scanning probe lithography
The properties of 2D materials devices are very sensitive to the physical, chemical and
structural interactions that might happen during processing. Low-invasive patterning …
structural interactions that might happen during processing. Low-invasive patterning …