Some embodiments may include a nanosecond pulser com prising a plurality of solid state
switches; a transformer having a stray inductance, L?, a stray capacitance, Cs, and a turn …

Some embodiments include a high voltage pulsing power supply. A high voltage pulsing
power supply may include: a high voltage pulser having an output that provides pulses with …

Various RF plasma systems are disclosed that do not require a matching network. In some
embodiments, the RF plasma system includes an energy storage capacitor; a switching …

(57) ABSTRACT A high voltage power system is disclosed. In some embodi ments, the high
voltage power system includes a high voltage pulsing power supply; a transformer …

Some embodiments include a nanosecond pulser circuit. In some embodiments, a
nanosecond pulser circuit may include: a high voltage power supply; a nanosecond pulser …

A plasma deposition system comprising a wafer platform, a second electrode, a first
electrode, a first high voltage pulser, and a second high voltage pulser. In some …

Some embodiments include a thermal management system for a nanosecond pulser. In
some embodiments, the thermal management system may include a switch cold plates …

A plasma deposition system comprising a wafer platform, a second electrode, a first
electrode, a first high voltage pulser, and a second high voltage pulser. In some …

Some embodiments may include a nanosecond pulser com prising a plurality of solid state
switches; a transformer having a stray inductance, L?, a stray capacitance, Cs, and a turn …

A phase difference between a reference clock signal and a feedback signal is digitally
detected. A resultant phase detection signal is digitally filtered, and a PLL (Phase Locked …