Recent advances on dielectrics technology for SiC and GaN power devices

F Roccaforte, P Fiorenza, G Greco, M Vivona… - Applied Surface …, 2014 - Elsevier
Silicon carbide (SiC) and gallium nitride (GaN) devices are considered as optimal solutions
to meet the requirements of the modern power electronics. In fact, they can allow an …

Binary group III-nitride based heterostructures: band offsets and transport properties

B Roul, M Kumar, MK Rajpalke, TN Bhat… - Journal of Physics D …, 2015 - iopscience.iop.org
In the last few years, there has been remarkable progress in the development of group III-
nitride based materials because of their potential application in fabricating various …

On current-voltage and capacitance-voltage characteristics of metal-semiconductor contacts

A TURUT - Turkish Journal of Physics, 2020 - journals.tubitak.gov.tr
It is expected the fact that the current following across metal-semiconductor (MS) rectifying
contact named as Schottky barrier diode (SBDs) and effect of sample temperature on their …

[HTML][HTML] MOCVD of AlN on epitaxial graphene at extreme temperatures

A Kakanakova-Georgieva, IG Ivanov… - …, 2021 - pubs.rsc.org
The initial stages of metal organic chemical vapor deposition (MOCVD) of AlN on epitaxial
graphene at temperatures in excess of 1200° C have been rationalized. The use of epitaxial …

A Comparative Study on the Electrical Properties of Vertical ( ) and (010) -Ga2O3 Schottky Barrier Diodes on EFG Single-Crystal Substrates

H Fu, H Chen, X Huang, I Baranowski… - … on Electron Devices, 2018 - ieeexplore.ieee.org
This paper reports a comprehensive study on the anisotropic electrical properties of vertical
(2̅01) and (010) β-Ga 2 O 3 Schottky barrier diodes (SBDs). The devices were fabricated …

Fluorine-implanted termination for vertical GaN Schottky rectifier with high blocking voltage and low forward voltage drop

S Han, S Yang, K Sheng - IEEE Electron Device Letters, 2019 - ieeexplore.ieee.org
In this letter, fluorine-implanted termination (FIT) has been demonstrated in vertical GaN-on-
GaN Schottky barrier diodes (SBDs). Owing to the unique feature of F ions that can become …

1.7-kV vertical GaN-on-GaN Schottky barrier diodes with helium-implanted edge termination

X Liu, F Lin, J Li, Y Lin, J Wu, H Wang… - … on Electron Devices, 2022 - ieeexplore.ieee.org
In this article, high-performance vertical gallium nitride (GaN)-on-GaN Schottky barrier
diodes (SBDs) with helium (He)-implanted edge termination (ET) structure were …

Leakage current by Frenkel–Poole emission in Ni/Au schottky contacts on Al0. 83In0. 17N/AlN/GaN heterostructures

E Arslan, S Bütün, E Ozbay - Applied Physics Letters, 2009 - pubs.aip.org
In order to determine the reverse-bias leakage current mechanisms in Schottky diodes on Al
0.83 In 0.17 N/AlN/GaN heterostructures, the temperature-dependent current-voltage …

Demonstration of AlN Schottky barrier diodes with blocking voltage over 1 kV

H Fu, I Baranowski, X Huang, H Chen… - IEEE Electron …, 2017 - ieeexplore.ieee.org
This letter reports the first demonstration of 1-kV-class AlN Schottky barrier diodes on
sapphire substrates by metal organic chemical vapor deposition. The device structure …

On temperature-dependent experimental IV and CV data of Ni/n-GaN Schottky contacts

N Yıldırım, K Ejderha, A Turut - Journal of Applied Physics, 2010 - pubs.aip.org
We report the current-voltage (IV) and capacitance-voltage characteristics (CV) of Ni/n-GaN
Schottky diodes. Gallium nitride is a highly promising wide band gap semiconductor for …