The self-assembly of block copolymers to generate nanopatterns is of great interest as an
inexpensive approach to sub-20 nm lithography. Compared to thermal annealing, solvent …

We use self-consistent field theory (SCFT) to study the directed self-assembly of laterally
confined diblock copolymers. In this study, we focus on systems in which the self-assembled …

Thin film morphologies of a 75.5 kg/mol polystyrene-block-polydimethylsiloxane (PS-b-
PDMS) diblock copolymer subject to solvent vapor annealing are described. The PS-b …

Self-assembly of block copolymers (BCPs) is an alternative patterning technique that
promises high resolution and density multiplication with lower costs. The defectivity of the …

Thermal scanning probe lithography (t-SPL) is applied to the fabrication of chemical guiding
patterns for directed self-assembly (DSA) of block copolymers (BCP). The two key steps of …

The challenges of patterning next-generation integrated circuits have driven the
semiconductor industry to look outside of traditional lithographic methods in order to …

We use self‐consistent field theory to study the self‐assembly of cylinder‐forming diblock
copolymers confined in a cylindrical prepattern. This situation arises in contact holes—the …

The creation of highly efficient guiding patterns for the directed self-assembly of block
copolymers by resistless nanolithography using atomic force microscopy (AFM) is …

The annihilation kinetics of an interacting 5/7-dislocation pair with oppositely apposing
Burgers vectors in a well-aligned hexagonal lattice of cylinders formed by asymmetric AB …

Directed self-assembly (DSA) is a promising approach for extending conventional
lithographic techniques by being able to print features with critical dimensions under 10 nm …