Influence of dielectric deposition parameters on the quantum well intermixing by impurity-free vacancy disordering

JS Yu, JD Song, YT Lee, H Lim - Journal of applied physics, 2002 - pubs.aip.org
We investigated the influence of the deposition parameters of SiO x and SiN x capping
layers in the plasma-enhanced chemical vapor deposition on the band gap energy shift of …

Influence of SiO2 and TiO2 dielectric layers on the atomic intermixing of InxGa1− xAs/InP quantum well structures

PL Gareso, M Buda, L Fu, HH Tan… - … science and technology, 2007 - iopscience.iop.org
We have studied the influence of SiO 2 and TiO 2 dielectric layers on the atomic intermixing
of In x Ga 1− x As/InP quantum well structures using the impurity-free vacancy disordering …

Effects of the thickness of dielectric capping layer and the distance of quantum wells from the sample surface on the intermixing of In0. 2Ga0. 8As/GaAs multiple …

JS Yu, JD Song, YT Lee, H Lim - Journal of the Korean …, 2003 - khu.elsevierpure.com
We investigated the effects of the thickness of SiO 2 and Si 3 N 4 capping layer and the
distance of quantum wells from the sample surface on the intermixing of In 0.2 Ga 0.8 …

Fabrication of multi-wavelength In0.2Ga0.8As/GaAs multiple quantum well laser diodes by area-selective impurity-free vacancy disordering using SiOx capping …

JS Yu, JD Song, YT Lee, H Lim - Applied Physics A, 2005 - Springer
This work studied the implementation of multi-wavelength laser diodes on a single substrate
through the position-dependent bandgap modification of the In 0.2 Ga 0.8 As/GaAs multiple …

Impurity-free vacancy diffusion of InGaAsP/InGaAsP multiple quantum well structures using SiH4-dependent dielectric cappings

JS Yu, YT Lee - Japanese Journal of Applied Physics, 2007 - iopscience.iop.org
We report the impurity-free vacancy diffusion (IFVD) behaviors of In 0.86 Ga 0.14 As 0.64 P
0.36/In 0.88 Ga 0.12 As 0.25 P 0.75 multiple quantum well (MQW) structures using dielectric …

Cathodoluminescence study of inductively coupled plasma (ICP) etched InP waveguide structures: Influence of the ridge dimension and dielectric capping

M Avella, J Jiménez, F Pommereau… - Materials Science and …, 2008 - Elsevier
This work is focused on the characterization of different defects introduced on InP material
during the fabrication of classical photonic structures (ridge waveguides,…). These defects …

Fabrication of wavelength-shifted In0. 2Ga0. 8As/GaAs multiple quantum well laser diodes by impurity-free vacancy disordering at different thermal annealing …

JS Yu, JD Song, YT Lee, H Lim - Semiconductor science and …, 2003 - iopscience.iop.org
We fabricated ridge-waveguide laser diodes with In 0.2 Ga 0.8 As/GaAs multiple quantum
wells (MQWs) that have undergone impurity-free vacancy disordering (IFVD) using the SiO 2 …

Disordering of InGaAs/GaAs multiquantum well structure by impurity-free vacancy diffusion for advanced optoelectronic devices and their integration

JS Yu, JM Kim, YT Lee, JD Song… - … Integrated Circuits VII, 2005 - spiedigitallibrary.org
We studied the impurity-free vacancy diffusion (IFVD) of In 0.2 Ga 0.8 As/GaAs multi-
quantum well (MQW) structures for advanced optoelectronic devices and their integration …

Device building blocks for photonic integration: design and process

CW Lee - 2008 - dr.ntu.edu.sg
Photonic integration involves integration of several photonic devices on one common
platform. It is able to reduce the system size and cost, improve the system reliability, and …

Improvement of photoluminescence and electroluminescence characteristics of MBE-grown In [sub 0.53] Ga [sub 0.47] As/In [sub 0.53](Ga [sub 0.6] Al [sub 0.4])[sub …

JS Yu, JD Song, JM Kim, SJ Bae… - Applied Physics A …, 2003 - search.ebscohost.com
We investigated the effect of rapid thermal annealing (RTA) on the photoluminescence (PL)
and electroluminescence of the In [SUB0. 53] Ga [SUB0. 47] As/In [SUB0. 53] Ga [SUB0. 6] …