Review of Si-based GeSn CVD growth and optoelectronic applications

Y Miao, G Wang, Z Kong, B Xu, X Zhao, X Luo, H Lin… - Nanomaterials, 2021 - mdpi.com
GeSn alloys have already attracted extensive attention due to their excellent properties and
wide-ranging electronic and optoelectronic applications. Both theoretical and experimental …

Halogen‐incorporated Sn catalysts for selective electrochemical CO2 reduction to formate

T Wang, J Chen, X Ren, J Zhang, J Ding… - Angewandte Chemie …, 2023 - Wiley Online Library
Electrochemically reducing CO2 to valuable fuels or feedstocks is recognized as a
promising strategy to simultaneously tackle the crises of fossil fuel shortage and carbon …

Raman study of strained Ge1− xSnx alloys

H Lin, R Chen, Y Huo, TI Kamins, JS Harris - Applied Physics Letters, 2011 - pubs.aip.org
The Ge-Ge longitudinal optical Raman peak has been measured in strained Ge 1− x Sn x
alloy layers grown on top of relaxed In y Ga 1− y As buffer layers on GaAs substrates by …

Raman spectral shift versus strain and composition in GeSn layers with 6%–15% Sn content

A Gassenq, L Milord, J Aubin, N Pauc, K Guilloy… - Applied Physics …, 2017 - pubs.aip.org
GeSn alloys are the subject of intense research activities as these group IV semiconductors
present direct bandgap behaviors for high Sn contents. Today, the control of strain becomes …

Highly Selective Dry Etching of Germanium over Germanium–Tin (Ge1–xSnx): A Novel Route for Ge1–xSnx Nanostructure Fabrication

S Gupta, R Chen, YC Huang, Y Kim, E Sanchez… - Nano …, 2013 - ACS Publications
We present a new etch chemistry that enables highly selective dry etching of germanium
over its alloy with tin (Ge1–x Sn x). We address the challenges in synthesis of high-quality …

High hole mobility tin-doped polycrystalline germanium layers formed on insulating substrates by low-temperature solid-phase crystallization

W Takeuchi, N Taoka, M Kurosawa… - Applied Physics …, 2015 - pubs.aip.org
We investigated the effects of incorporation of 0%–2% tin (Sn) into amorphous germanium
(Ge) on its crystallization behavior and electrical properties. Incorporation of only 0.2% Sn …

Relaxed and strained patterned germanium-tin structures: a Raman scattering study

R Cheng, W Wang, X Gong, L Sun, P Guo… - ECS Journal of Solid …, 2013 - iopscience.iop.org
We report the first realization of fully-released and relaxed Ge 1-x Sn x structures on Ge
substrate. The coefficients of Raman peak shift a and b due to the alloy disorder and strain …

Thermoelectric efficiency of epitaxial GeSn alloys for integrated Si-based applications: assessing the lattice thermal conductivity by Raman thermometry

D Spirito, N von den Driesch… - ACS Applied Energy …, 2021 - ACS Publications
Energy harvesting for Internet of Things applications, comprising sensing, life sciences,
wearables, and communications, requires efficient thermoelectric (TE) materials, ideally …

Epitaxial growth of highly compressively strained GeSn alloys up to 12.5% Sn

M Oehme, D Buca, K Kostecki, S Wirths… - Journal of crystal …, 2013 - Elsevier
This paper reports on the growth and characterization of highly compressive strained GeSn
layers on thin strain relaxed Ge virtual substrates on Si wafers. Sn concentration up to …

70° C synthesis of high-Sn content (25%) GeSn on insulator by Sn-induced crystallization of amorphous Ge

K Toko, N Oya, N Saitoh, N Yoshizawa… - Applied Physics …, 2015 - pubs.aip.org
70 C synthesis of high-Sn content (25%) GeSn on insulator by Sn-induced crystallization of
amorphous Ge | Applied Physics Letters | AIP Publishing Skip to Main Content Umbrella Alt …