Indium nitride (InN): A review on growth, characterization, and properties

AG Bhuiyan, A Hashimoto, A Yamamoto - Journal of applied physics, 2003 - pubs.aip.org
During the last few years the interest in the indium nitride (InN) semiconductor has been
remarkable. There have been significant improvements in the growth of InN films. High …

Steady-state and transient electron transport within the III–V nitride semiconductors, GaN, AlN, and InN: a review

SK O'leary, BE Foutz, MS Shur, LF Eastman - Journal of Materials Science …, 2006 - Springer
The III–V nitride semiconductors, gallium nitride, aluminum nitride, and indium nitride, have,
for some time now, been recognized as promising materials for novel electronic and …

Monte Carlo simulation of electron transport in the III-nitride wurtzite phase materials system: binaries and ternaries

M Farahmand, C Garetto, E Bellotti… - … on electron devices, 2001 - ieeexplore.ieee.org
We present a comprehensive study of the transport dynamics of electrons in the ternary
compounds, Al/sub x/Ga/sub 1-x/N and In/sub x/Ga/sub 1-x/N. Calculations are made using …

Adsorption of gas molecules on graphene-like InN monolayer: A first-principle study

X Sun, Q Yang, R Meng, C Tan, Q Liang, J Jiang… - Applied Surface …, 2017 - Elsevier
Using first-principles calculation within density functional theory (DFT), we study the gas
(CO, NH 3, H 2 S, NO 2, NO, SO 2) adsorption properties on the surface of single-layer …

[图书][B] Analysis and simulation of heterostructure devices

V Palankovski, R Quay - 2004 - books.google.com
Communication and information systems are subject to rapid and highly so phisticated
changes. Currently semiconductor heterostructure devices, such as Heterojunction Bipolar …

Effect of an AlN buffer layer on the epitaxial growth of InN by molecular-beam epitaxy

H Lu, WJ Schaff, J Hwang, H Wu, G Koley… - Applied Physics …, 2001 - pubs.aip.org
The effect of an AlN buffer layer on the epitaxial growth of InN by molecular-beam epitaxy
MBE is studied. Using an AlN buffer layer can significantly improve the structural and …

Low-field electron mobility in wurtzite InN

VM Polyakov, F Schwierz - Applied physics letters, 2006 - pubs.aip.org
We report on the low-field electron mobility in bulk wurtzite InN at room temperature and
over a wide range of carrier concentration calculated by the ensemble Monte Carlo (MC) …

Optical excitations of graphene-like materials: group III-nitrides

NT Han, VK Dien, TR Chang, MF Lin - Nanoscale Advances, 2023 - pubs.rsc.org
By using first-principles calculations, we have studied the electronic and optical
characteristics of group III-nitrides, such as BN, AlN, GaN, and InN monolayers. The …

Band structure nonlocal pseudopotential calculation of the III-nitride wurtzite phase materials system. Part I. Binary compounds GaN, AlN, and InN

M Goano, E Bellotti, E Ghillino, G Ghione… - Journal of Applied …, 2000 - pubs.aip.org
This work presents nonlocal pseudopotential calculations based on realistic, effective atomic
potentials of the wurtzite phase of GaN, InN, and AlN. A formulation formulation for the model …

Effective mass of InN epilayers

SP Fu, YF Chen - Applied Physics Letters, 2004 - pubs.aip.org
We report on the study of plasma edge absorption of InN epilayers with free electron
concentration ranging from 3.5× 10 17 to 5× 10 19 cm− 3⁠. Together with the previously …