Aluminum nitride (AlN) is a semiconductor material possessing a hexagonal wurtzite crystal structure with a large band gap of 6.2 eV. AlN thin films have several potential applications …
Thulium (Tm) doped aluminum nitride (AlN) thin films are deposited by radio frequency (RF) magnetron sputtering in a pure nitrogen atmosphere. As-deposited thin films are irradiated …
Abstract Neodymium (Nd) and Tungsten (W) doped Aluminum Nitride (AlN) thin films deposited on Si (110) substrates are fabricated by reactive magnetron sputtering technique …
Yttrium (Y) doped aluminum nitride (AlN) thin films are prepared using reactive magnetron sputtering method in a nitrogen atmosphere at room temperature. Thermal annealing at a …
S Belhachi - Brazilian Journal of Physics, 2023 - Springer
Structural, electronic, and magnetic properties of rare earth (Eu, Er)-doped AlGaN are investigated in wurtzite structure, based on spin-polarized density functional theory with the …
Abstract Thin films of Aluminum Nitride (AlN) doped with Gadolinium (Gd) are deposited on Si (111) substrates, in pure Nitrogen (N) atmosphere using reactive magnetron sputtering …
Erbium (Er)-doped Aluminum Nitride (AlN) thin films were deposited and fabricated on Si (100) and Si (111) substrates in a Nitrogen atmosphere using the plasma magnetron …
D Czernia, P Konieczny, E Juszyńska-Gałązka… - Available at SSRN … - papers.ssrn.com
The influence of 1.9 MeV proton irradiation on structural and magnetic properties has been explored in the two-dimensional (2D) NiSO4 (1, 3-phenylenediamine) 2 coordination …
Abstract Thin films of Chromium (Cr) doped Aluminum Nitride (AlN) have been prepared by radio frequency magnetron sputtering technique at room temperature and pressure …