Dielectric relaxation of high-k oxides

C Zhao, CZ Zhao, M Werner, S Taylor… - Nanoscale research …, 2013 - Springer
Frequency dispersion of high-k dielectrics was observed and classified into two parts:
extrinsic cause and intrinsic cause. Frequency dependence of dielectric constant (dielectric …

Structural, chemical and optical properties of cerium dioxide film prepared by atomic layer deposition on TiN and Si substrates

S Vangelista, R Piagge, S Ek, T Sarnet, G Ghidini… - Thin Solid Films, 2017 - Elsevier
Thin films of cerium dioxide (CeO 2) were deposited by atomic layer deposition (ALD) at
250° C on both Si and titanium nitride (TiN) substrates. The ALD growth produces CeO 2 …

Tri-phase photonic crystal emitter for thermophotovoltaic systems

V Singhal, J Zhu, J Song, H Wang, P Bermel - Applied Physics Letters, 2023 - pubs.aip.org
Thermophotovoltaics (TPVs) are devices that convert thermal radiation into electricity using
a low-bandgap photovoltaic (PV) cell. While the theoretical efficiency can approach the …

Ce(IV) Complexes with Donor-Functionalized Alkoxide Ligands: Improved Precursors for Chemical Vapor Deposition of CeO2

HC Aspinall, J Bacsa, AC Jones, JS Wrench… - Inorganic …, 2011 - ACS Publications
Thin films of ceria (CeO2) have many applications, and their synthesis by liquid-injection
MOCVD (metal–organic chemical vapor deposition) or ALD (atomic layer deposition) …

Electronic structure of cerium oxide gate dielectric grown by plasma-enhanced atomic layer deposition

WH Kim, WJ Maeng, MK Kim… - Journal of The …, 2011 - iopscience.iop.org
We have systematically investigated the electronic structure of CeO 2 dielectric by plasma
enhanced atomic layer deposition (PE-ALD). The CeO 2 films were deposited by using …

Rational development of guanidinate and amidinate based cerium and ytterbium complexes as atomic layer deposition precursors: synthesis, modeling, and …

P Kaur, L Mai, A Muriqi, D Zanders… - … A European Journal, 2021 - Wiley Online Library
Owing to the limited availability of suitable precursors for vapor phase deposition of rare‐
earth containing thin‐film materials, new or improved precursors are sought after. In this …

Low temperature epitaxial oxide ultrathin films and nanostructures by atomic layer deposition

M Coll, J Gazquez, A Palau, M Varela… - Chemistry of …, 2012 - ACS Publications
Highly epitaxial and pure (001) CeO2 ultrathin films have been prepared by atomic layer
deposition (ALD) at 275° C on Y-stabilized ZrO2 cubic fluorite single crystal substrate using …

Atomic/molecular layer deposition of cerium (III) hybrid thin films using rigid organic precursors

P Kaur, A Muriqi, JL Wree, R Ghiyasi, M Safdar… - Dalton …, 2022 - pubs.rsc.org
An atomic/molecular layer deposition (ALD/MLD) process for the fabrication of cerium-based
metal–organic hybrid films is demonstrated for the first time. The highly reactive cerium (III) …

Growth characteristics and film properties of cerium dioxide prepared by plasma-enhanced atomic layer deposition

WH Kim, MK Kim, WJ Maeng, J Gatineau… - Journal of The …, 2011 - iopscience.iop.org
CeO 2 thin films were deposited by plasma-enhanced atomic layer deposition (PE-ALD).
Novel Ce (iPrCp) 3 [tris (isopropyl-cyclopentadienyl) cerium] was used as a Ce precursor …

Heterobi- and Trimetallic Cerium(IV) tert-Butoxides with Mono-, Di-, and Trivalent Metals (M = K(I), Ge(II), Sn(II), Pb(II), Al(III), Fe(III))

J Schläfer, S Stucky, W Tyrra, S Mathur - Inorganic chemistry, 2013 - ACS Publications
The reaction of C erium A mmonium N itrate (CAN) with varying amounts of KO t Bu
produced homometallic Ce (O t Bu) 4 (NC5H5) 2 (1) and the heterometallic derivative KCe2 …