State of the art and future perspectives in advanced CMOS technology

HH Radamson, H Zhu, Z Wu, X He, H Lin, J Liu… - Nanomaterials, 2020 - mdpi.com
The international technology roadmap of semiconductors (ITRS) is approaching the
historical end point and we observe that the semiconductor industry is driving …

Miniaturization of CMOS

HH Radamson, X He, Q Zhang, J Liu, H Cui, J Xiang… - Micromachines, 2019 - mdpi.com
When the international technology roadmap of semiconductors (ITRS) started almost five
decades ago, the metal oxide effect transistor (MOSFET) as units in integrated circuits (IC) …

Observation of Rich Defect Dynamics in Monolayer MoS2

H Ravichandran, T Knobloch, A Pannone, A Karl… - ACS …, 2023 - ACS Publications
Defects play a pivotal role in limiting the performance and reliability of nanoscale devices.
Field-effect transistors (FETs) based on atomically thin two-dimensional (2D) …

Deep neural network analysis models for complex random telegraph signals

M Robitaille, HB Yang, L Wang, B Deng, NY Kim - Scientific Reports, 2023 - nature.com
Time-fluctuating signals are ubiquitous and diverse in many physical, chemical, and
biological systems, among which random telegraph signals (RTSs) refer to a series of …

Total-ionizing-dose response of highly scaled gate-all-around Si nanowire CMOS transistors

M Gorchichko, EX Zhang, P Wang… - … on Nuclear Science, 2021 - ieeexplore.ieee.org
Gate-all-around (GAA) silicon nanowire (NW) CMOS transistors demonstrate outstanding
total-ionizing-dose (TID) tolerance due to the ultrascaled gate dielectric thickness, enhanced …

Ultra-low noise defect probing instrument for defect spectroscopy of MOS transistors

M Waltl - IEEE Transactions on Device and Materials Reliability, 2020 - ieeexplore.ieee.org
It is commonly accepted that the performance and time-to-failure of modern semiconductor
transistors are seriously affected by single defects located in the insulator or at the insulator …

Random telegraph noise of a 28-nm cryogenic MOSFET in the coulomb blockade regime

HB Yang, M Robitaille, X Chen… - IEEE Electron …, 2021 - ieeexplore.ieee.org
We observe rich phenomena of two-level random telegraph noise (RTN) from a commercial
bulk 28-nm p-MOSFET (PMOS) near threshold at 14 K, where a Coulomb blockade (CB) …

[HTML][HTML] Separation of electron and hole trapping components of PBTI in SiON nMOS transistors

M Waltl, B Stampfer, G Rzepa, B Kaczer… - Microelectronics …, 2020 - Elsevier
In nMOS transistors the impact of positive bias temperature instability (PBTI) on the device
performance is typically considered negligible and has thus been barely studied in the past …

Spatially Controlled Generation and Probing of Random Telegraph Noise in Metal Nanocrystal Embedded HfO2 Using Defect Nanospectroscopy

A Ranjan, FM Puglisi, J Molina-Reyes… - ACS Applied …, 2022 - ACS Publications
Random telegraph noise (RTN) is often considered a nuisance or, more critically, a key
reliability challenge for miniaturized semiconductor devices. However, this picture is …

Reliability of miniaturized transistors from the perspective of single-defects

M Waltl - Micromachines, 2020 - mdpi.com
To analyze the reliability of semiconductor transistors, changes in the performance of the
devices during operation are evaluated. A prominent effect altering the device behavior are …