Conspectus Hot wire chemical vapor deposition (HWCVD), also referred to as catalytic CVD
(Cat-CVD), has been used to produce Si-containing thin films, nanomaterials, and functional …

Thermal decomposition of tetraethylsilane was investigated at temperatures up to 1330 K
using flash pyrolysis vacuum ultraviolet photoionization mass spectrometry. Density …

We report on mass spectrometry of residual gases after dissociation of tetramethylsilane
(TMS) during the synthesis of silicon carbide (SiC) nanocrystals (NCs) by an atmospheric …

Injection of precursor molecules into a plasma often results in particle generation or
deposition in the source, compromising film quality and plasma operation. We present here …

The thermal decomposition of tetramethylsilane (TMS) was studied over the temperature
range of 298–1450 K by combining flash pyrolysis vacuum ultraviolet photoionization time-of …

The gas-phase reaction chemistry when using dimethylsilane (DMS) as a source gas in a
hot-wire chemical vapor deposition (CVD) process has been studied in this work. The …

The gas-phase reaction chemistry of using 1-methylsilacyclobutane (MSCB) in the hot-wire
chemical vapor deposition (CVD) process has been investigated by studying the …

Abstract The decomposition of 1, 1‐dimethyl‐1‐silacyclobutane (DMSCB) on a heated
tungsten filament has been studied using vacuum ultraviolet laser single photon ionization …

To study the effect of an Si–Si bond on gas-phase reaction chemistry in the hot-wire
chemical vapor deposition (HWCVD) process with a single source alkylsilane molecule, soft …

The formation of methyl radical from the decomposition of four methyl-substituted silane
molecules, including monomethylsilane (MMS), dimethylsilane (DMS), trimethylsilane …