Recent advances in flexible and stretchable electronics (FSE), a technology diverging from
the conventional rigid silicon technology, have stimulated fundamental scientific and …

Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

Described herein is a method of depositing a plasma resistant ceramic coating onto a
surface of a chamber component using a non-line-of-sight (NLOS) deposition process, such …

Described herein are articles, systems and methods where a plasma resistant coating is
deposited onto a surface of a porous chamber component and onto pore walls within the …

Described herein are articles, systems and methods where a plasma resistant coating is
deposited onto a surface of a porous chamber component and onto pore walls within the …

To increase energy density in lithium-ion batteries (LIBs), novel anode materials are
considered based on conversion and alloying mechanisms as these typically possess far …

Ln2O3 thin films with optically active f-electrons (Ln= Pr, Nd, Sm, Eu, Tb, Dy, Ho, Er, Tm, Yb)
have been grown on Si (100) and soda lime glass substrates by atomic layer deposition …

Thin films of Er2O3 films were grown by atomic layer deposition using the Er precursor tris (1-
(dimethylamino)-3, 3-dimethylbut-1-en-2-olate) erbium (III)(Er (L1) 3), with water as the co …

Al 2 O 3/ZnO nanolaminates are promising for thin-film transistors and photoluminescence
applications. In this work, the thermal induced interface changes of Al 2 O 3/ZnO …

Thin mixed and nanolaminate films of ZrO 2 and Al 2 O 3 were grown by atomic layer
deposition from the corresponding metal chlorides and water. The films were grown at 350 C …