Defect related luminescence in silicon dioxide network: a review

R Salh - Crystalline Silicon-Properties and Uses, 2011 - books.google.com
The discovery of strong luminescence at room temperature from silicon cluster has attracted
an enormous attention in recent years due to its potential applications in Si-based …

Trapped-electron centers in pure and doped glassy silica: A review and synthesis

DL Griscom - Journal of Non-Crystalline Solids, 2011 - Elsevier
This paper reviews half a century of research on radiation-induced point defects in pure and
doped glassy silica and its crystalline polymorph α quartz, placing emphasis on trapped …

Defects in oxide glasses

L Skuja, M Hirano, H Hosono… - physica status solidi (c …, 2005 - Wiley Online Library
An insight into the present understanding of point defects in the simplest and the most
radiation‐resistant oxide glass, glassy silicon dioxide (silica) is presented. The defects and …

Blue photo-and electroluminescence of silicon dioxide layers ion-implanted with group IV elements

L Rebohle, J Von Borany, H Fröb, W Skorupa - Applied Physics B, 2000 - Springer
The microstructural, optical and electrical properties of Si-, Ge-and Sn-implanted silicon
dioxide layers were investigated. It was found, that these layers exhibit strong …

Optical properties of defects in silica

L Skuja - Defects in SiO2 and related dielectrics: Science and …, 2000 - Springer
The optical properties of point defects are frequently the most important parameter in
applications of glassy silica. They are relatively easy to measure on standard …

Structure and properties of defects in amorphous silica: new insights from embedded cluster calculations

PV Sushko, S Mukhopadhyay… - Journal of Physics …, 2005 - iopscience.iop.org
We briefly review some of the approaches which have been used to study the distributions of
defect properties in amorphous silica and focus mainly on the implementation of the …

Cathodoluminescence of Ge+, Si+, and O+ implanted SiO2 layers and the role of mobile oxygen in defect transformations

HJ Fitting, T Barfels, AN Trukhin, B Schmidt… - Journal of Non …, 2002 - Elsevier
Thermally grown SiO2 layers of thickness d= 500 nm have been implanted by Ge+, Si+, and
O+ ions of energy 350, 150, and 100 keV, respectively, and a uniform implantation dose of …

Correlation between the atomic structure, formation energies, and optical absorption of neutral oxygen vacancies in amorphous silica

S Mukhopadhyay, PV Sushko, AM Stoneham… - Physical Review B …, 2005 - APS
We have calculated the distributions of structural parameters, formation energies, and defect
levels of neutral oxygen vacancies (NOV) in amorphous silica (a-Si O 2). All oxygen sites in …

Luminescence characteristics and defect formation in silica glasses under H and He ion irradiation

S Nagata, S Yamamoto, A Inouye, B Tsuchiya… - Journal of nuclear …, 2007 - Elsevier
Ion beam induced luminescence from silica glasses containing various OH concentrations
was measured to examine the effects of OH and the energy deposition processes on the …

Photosensitivity of SiO2–Al and SiO2–Na glasses under ArF (193 nm) laser

AN Trukhin, J Teteris, A Fedotov, DL Griscom… - Journal of non …, 2009 - Elsevier
Photosensitivity of SiO2–Al and SiO2–Na glass samples was probed by means of the
induced optical absorption and luminescence as well as by electron spin-resonance (ESR) …