Accurate wavefront measurement using double-grating Ronchi lateral shearing
interferometry significantly relies on the accuracy of shear-phase retrieval. Traditional …

In this paper we report on the performance enhancements on the NXT immersion scanner
platform to support the immersion lithography roadmap. We particular discuss scanner …

We propose a general method of designing phase-analysis algorithms for Ronchi phase-
shifting lateral-shearing interferometry. Based on the expression and method, three new …

Ronchi shearing interferometry is a promising technique for in situ wavefront aberration
measurement of the projection lens in advanced photolithography systems. The Van Cittert …

The accuracy of the shear-phase retrieval method is critical for accurate wavefront
aberration measurements in double-grating Ronchi lateral shearing interferometry …

The Ronchi test is widely used for wavefront measurements in advanced lithography tools,
and a physical optics explanation of the Ronchi test based on scalar diffraction theory can …

摘要提出了一种基于八角度孤立空检测标记的超高NA 光刻投影物镜高阶波像差检测方法.
通过对八角度孤立空检测标记的空间像进行主成分分析(PCA) 和多元线性回归分析 …

A demonstrator adaptive optics-system with a thermally actuated active mirror (AM) is
presented to pre-study feasibility of sub-nm wavefront control in extreme ultraviolet (EUV) …

Ronchi lateral shearing interferometry is a promising wavefront sensing technology with the
advantages of simple structure and no reference light, which can realize a high-precision …

Double-Ronchi shearing interferometry is a promising technique for insitu wavefront
aberration measurement of the projection lens in photolithography systems. In practice, the …