Gas–solid fluidization of cohesive powders

F Raganati, R Chirone, P Ammendola - Chemical Engineering Research …, 2018 - Elsevier
Fine and ultrafine powders (down to nanoparticles) have recently received growing interest
in both industrial and academic sectors due to their very distinctive features, mainly coming …

Improving flow and fluidization quality of fine and ultrafine particles via nanoparticle modulation

J Wang, Y Shao, J Zhu - Nano Research, 2023 - Springer
Fine and ultrafine particles possess great potential for industrial applications ascribed from
their huge specific surface area and ability to provide good gas–solid contact. However …

Atmospheric atomic layer deposition of SnO 2 thin films with tin (ii) acetylacetonate and water

VH Nguyen, M Akbari, A Sekkat, HTT Ta… - Dalton …, 2022 - pubs.rsc.org
Due to its unique optical, electrical, and chemical properties, tin dioxide (SnO2) thin films
attract enormous attention as a potential material for gas sensors, catalysis, low-emissivity …

[HTML][HTML] Controlled growth of TiO2 nanoparticles on graphene by hydrothermal method for visible-light photocatalysis

TLT Le, THT Le, KN Van, H Van Bui, TG Le… - Journal of Science …, 2021 - Elsevier
This work presents the controlled synthesis of TiO 2/graphene photocatalysts by
hydrothermal method using TiCl 4 as a precursor. The influence of the precursor …

Diffusion‐Mediated Growth and Size‐Dependent Nanoparticle Reactivity during Ruthenium Atomic Layer Deposition on Dielectric Substrates

J Soethoudt, F Grillo, EA Marques… - Advanced materials …, 2018 - Wiley Online Library
Understanding the growth mechanisms during the early stages of atomic layer deposition
(ALD) is of interest for several applications including thin film deposition, catalysis, and area …

Impact of precursor exposure on process efficiency and film properties in spatial atomic layer deposition

VH Nguyen, A Sekkat, C Jimenez, D Munoz… - Chemical Engineering …, 2021 - Elsevier
Being able to control the exposure of precursors to the substrate surface is essential towards
an optimum Atomic Layer Deposition (ALD) process. Conventional ALD usually requires …

Nanoparticle sintering in atomic layer deposition of supported catalysts: Kinetic modeling of the size distribution

F Grillo, JA Moulijn, MT Kreutzer, JR van Ommen - Catalysis Today, 2018 - Elsevier
In industrial catalysis, the sintering of supported nanoparticles (NPs) is often associated with
the loss of catalyst activity and thus with periodic plant downtime and economic burdens …

From Single Atoms to Nanoparticles: Autocatalysis and Metal Aggregation in Atomic Layer Deposition of Pt on TiO2 Nanopowder

F Grillo, H Van Bui, D La Zara, AAI Aarnink… - Small, 2018 - Wiley Online Library
A fundamental understanding of the interplay between ligand‐removal kinetics and metal
aggregation during the formation of platinum nanoparticles (NPs) in atomic layer deposition …

Atmospheric-pressure atomic layer deposition: recent applications and new emerging applications in high-porosity/3D materials

M Chen, MP Nijboer, AY Kovalgin, A Nijmeijer… - Dalton …, 2023 - pubs.rsc.org
Atomic layer deposition (ALD) is a widely recognized technique for depositing ultrathin
conformal films with excellent thickness control at Ångström or (sub) monolayer level …

Thermal atomic layer deposition of gold nanoparticles: controlled growth and size selection for photocatalysis

FSM Hashemi, F Grillo, VR Ravikumar, D Benz… - Nanoscale, 2020 - pubs.rsc.org
Gold nanoparticles have been extensively studied for their applications in catalysis. For Au
nanoparticles to be catalytically active, controlling the particle size is crucial. Here we …