Recent progress in the chemistry of metal amidinates and guanidinates: syntheses, catalysis and materials
FT Edelmann - Advances in organometallic chemistry, 2013 - Elsevier
This review provides a comprehensive overview of the most recent progress in chemistry
and applications of metal complexes containing heteroallylic ligands such as amidinates …
and applications of metal complexes containing heteroallylic ligands such as amidinates …
Amidinates, guanidinates and iminopyrrolidinates: Understanding precursor thermolysis to design a better ligand
ST Barry - Coordination Chemistry Reviews, 2013 - Elsevier
The thermolysis of metal compounds incorporating amidinate-type ligands (RN (H) C (X)
NR, where R is any alkyl and X is an alkyl or an amido) show a great complexity and …
NR, where R is any alkyl and X is an alkyl or an amido) show a great complexity and …
Atomic layer deposition of noble metals and their oxides
J Hämäläinen, M Ritala, M Leskelä - Chemistry of Materials, 2014 - ACS Publications
Atomic layer deposition (ALD) is an attractive method to deposit thin films for advanced
technological applications such as microelectronics and nanotechnology. One material …
technological applications such as microelectronics and nanotechnology. One material …
Principles of precursor design for vapour deposition methods
Chemical vapour deposition (CVD) and atomic layer deposition (ALD) are attractive
techniques for depositing a wide spectrum of thin solid film materials, for a broad spectrum of …
techniques for depositing a wide spectrum of thin solid film materials, for a broad spectrum of …
On atomic layer deposition: Current progress and future challenges
BC Mallick, CT Hsieh, KM Yin… - ECS Journal of Solid …, 2019 - iopscience.iop.org
Atomic layer deposition (ALD) relies on self-limiting reaction within a cyclic process and is
being considered as a potential technique for synthesizing nanomaterials with precisely …
being considered as a potential technique for synthesizing nanomaterials with precisely …
Polarization-dependent properties of the cladding modes of a single mode fiber covered with gold nanoparticles
The properties of the high order cladding modes of standard optical fibers are measured in
real-time during the deposition of gold nanoparticle layers by chemical vapor deposition …
real-time during the deposition of gold nanoparticle layers by chemical vapor deposition …
Chemistry of gold (I, III) complexes with organic ligands as potential MOCVD precursors for fabrication of thin metallic films and nanoparticles
TV Basova, A Hassan, NB Morozova - Coordination Chemistry Reviews, 2019 - Elsevier
The present review deals with the chemistry of complexes of gold (I) and gold (III) with
organic ligands. Compounds classified according to the type of coordinating ligands and …
organic ligands. Compounds classified according to the type of coordinating ligands and …
Recent advances using guanidinate ligands for chemical vapour deposition (CVD) and atomic layer deposition (ALD) applications
Volatile metal complexes are important for chemical vapour deposition (CVD) and atomic
layer deposition (ALD) to deliver metal components to growing thin films. Compounds that …
layer deposition (ALD) to deliver metal components to growing thin films. Compounds that …
Tris (dimethylamido) aluminum (III): An overlooked atomic layer deposition precursor
Aluminum oxide and aluminum nitride-containing films were grown by atomic layer
deposition (ALD) and plasma-enhanced atomic layer deposition (PE-ALD) by employing an …
deposition (ALD) and plasma-enhanced atomic layer deposition (PE-ALD) by employing an …
Chemistry of Cu (acac) 2 on Ni (110) and Cu (110) surfaces: Implications for atomic layer deposition processes
Q Ma, F Zaera - Journal of Vacuum Science & Technology A, 2013 - pubs.aip.org
The thermal chemistry of copper (II) acetylacetonate, Cu (acac) 2, on Ni (110) and Cu (110)
single-crystal surfaces was probed under vacuum by using x-ray photoelectron …
single-crystal surfaces was probed under vacuum by using x-ray photoelectron …