Nanoimprint lithography steppers for volume fabrication of leading-edge semiconductor integrated circuits

SV Sreenivasan - Microsystems & nanoengineering, 2017 - nature.com
This article discusses the transition of a form of nanoimprint lithography technology, known
as Jet and Flash Imprint Lithography (J-FIL), from research to a commercial fabrication …

[HTML][HTML] Step & flash imprint lithography

DJ Resnick, SV Sreenivasan, CG Willson - Materials today, 2005 - Elsevier
The escalating cost of next generation lithography (NGL) is driven in part by the need for
complex sources and optics. The cost for a single NGL tool could soon exceed $50 million, a …

[图书][B] Compliant mechanisms: design of flexure hinges

N Lobontiu - 2002 - taylorfrancis.com
Flexure hinges hold several advantages over classical rotation joints, including no friction
losses, no need for lubrication, no hysteresis, compactness, capacity to be utilized in small …

Design of a low-cost nano-manipulator which utilizes a monolithic, spatial compliant mechanism

ML Culpepper, G Anderson - Precision engineering, 2004 - Elsevier
This paper presents the design of a novel, low-cost nano-manipulator which uses a six-axis
compliant mechanism which is driven by electromagnetic actuators. The mechanism's …

Template for room temperature, low pressure micro-and nano-imprint lithography

T Bailey, BJ Choi, M Colburn, SV Sreenivasan… - US Patent …, 2004 - Google Patents
Described are imprint lithography templates, methods of forming and using the templates,
and a template holder device. An imprint lithography template may include a body with a …

High precision orientation alignment and gap control stages for imprint lithography processes

BJ Choi, SV Sreenivasan, SC Johnson - US Patent 6,873,087, 2005 - Google Patents
Processes and associated devices for high precision positioning of a template an substrate
during imprint lithography includes a calibration system with a course calibration stage and …

Modeling and controller design of a 6-DOF precision positioning system

K Cai, Y Tian, X Liu, S Fatikow, F Wang, L Cui… - … Systems and Signal …, 2018 - Elsevier
A key hurdle to meet the needs of micro/nano manipulation in some complex cases is the
inadequate workspace and flexibility of the operation ends. This paper presents a 6-degree …

[PDF][PDF] Development and advantages of step-and-flash lithography

M Colburn, T Bailey, BJ Choi, JG Ekerdt… - Solid State …, 2001 - researchgate.net
Optical lithography is being extended to pattern ever-smaller features. A combination of
improvements in optics, further reduction in wavelength, and introduction of more complex …

Step and repeat UV nanoimprint lithography tools and processes

I McMackin, J Choi, P Schumaker… - Emerging …, 2004 - spiedigitallibrary.org
Step and Flash TM Imprint Lithography (S-FIL TM) process is a step and repeat nano-
replication technique based on UV curable low viscosity liquids. Molecular Imprints, Inc.(MII) …

High-resolution overlay alignment methods for imprint lithography

SV Sreenivasan, BJ Choi, M Colburn… - US Patent 6,921,615, 2005 - Google Patents
4,694,703 A 9/1987 Routson A method of determining and correcting alignment during
4,707,218 A 11/1987 Giammarco et al. imprint lithography process is described. During an …