Environmental impact assessment of chemical mechanical planarization consumables: challenges, future needs, and perspectives
R Venkataswamy, L Trimble, A McDonald… - ACS Sustainable …, 2024 - ACS Publications
This paper provides a detailed overview of the environmental impacts and sustainability of
chemical mechanical planarization (CMP) consumable manufacturing in the semiconductor …
chemical mechanical planarization (CMP) consumable manufacturing in the semiconductor …
Synthesis, characterization and CMP property of neat and doped mesoporous ceria as defective active particle abrasives
Y Chen, P Li, C Wang, L Zhong, A Chen - Surfaces and Interfaces, 2025 - Elsevier
A successful chemical mechanical polishing or planarization (CMP) practice generally
depends on the physicochemical properties of abrasive materials, including architecture …
depends on the physicochemical properties of abrasive materials, including architecture …