Directed self-assembly of block copolymers is a bottom-up approach to nanofabrication that
has attracted high interest in recent years due to its inherent simplicity, high throughput, low …

In the integration flow of directed self-assembly with block copolymers (BCP), the selective
removal of one phase of the polymer with respect to the other one is an important step …

The creation of highly efficient guiding patterns for the directed self-assembly of block
copolymers by resistless nanolithography using atomic force microscopy (AFM) is …

Block co-polymer (BCP) lithography is becoming an established technique for patterning
beyond optical lithography limitations. It is based on combining the intrinsic property of block …

A model has been developed for the simulation of block copolymer (BCP) directed self-
assembly (DSA) based on a coarse grained polymer model that anneals using molecular …

Directed Self-Assembly (DSA) is today a credible alternative lithographic technology for
semiconductor industry [1]. In the coming years, DSA integration could be a standard …

The semiconductor devices dimensions continue to shrink to keep up with the ITRS
roadmap. Due to delay and extensive cost of EUV for 14 nm technology node and beyond …

For sub-10 nm technologies, the semiconductor industry is facing the limits of conventional
lithography to achieve narrow dimensions. Directed self-assembly (DSA) of block …

Poly (styrene)-block-poly (methylmethacrylate)(PS-b-PMMA) block-copolymers (BCP)
systems synthesized on an industrial scale and satisfying microelectronic's requirements for …

High-density and high-resolution line and space patterns on surfaces are obtained by
directed self-assembly of lamella-forming block copolymers (BCPs) using wide-stripe …