This topical review provides an overview of nanolithographic techniques for nanoarrays.
Using patterning techniques such as lithography, normally we aim for a higher order …

We review the performance and applications of an extreme ultraviolet interference
lithography (EUV-IL) system built at the Swiss Light Source of the Paul Scherrer Institut …

The effects of antiplasticization on the mechanical properties of dense arrays of poly (methyl
methacrylate)(PMMA) beams less than 75 nm in width were investigated through …

Outstanding technology innovations have continuously allowed photolithography to remain
at the forefront of semiconductor manufacturing for decades. New materials and processes …

In this study, we present the performance of an extreme ultraviolet interference lithography
(EUV-IL) setup that was reconstructed at Taiwan Light Source 21B2 EUV beamline in the …

The authors demonstrate generation of high-resolution nanostructures using achromatic
spatial frequency multiplication in the extreme ultraviolet wavelength region. The technique …

The limited pattern area of periodic nanostructures limits the development of practical
devices. This study introduces an X-ray interference lithography (XIL) stitching technique to …

DNA oligonucleotides of different sequences were patterned at the nanoscale. Areas of
positive charge were generated by exposure of insulating substrates, spin-on hydrogen …

High-resolution patterning of periodic structures over large areas has several applications in
science and technology. One such method, based on the long-known Talbot effect observed …

We report the initial results from a 4X reduction interferometric lithography technique using
extreme ultraviolet (EUV) radiation from a new undulator on the Aladdin storage ring at the …