Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
M Kassmi, J Pointet, P Gonon, A Bsiesy… - Journal of Applied …, 2016 - pubs.aip.org
Dielectric spectroscopy is carried out for intrinsic and aluminum-doped TiO 2 rutile films
which are deposited on RuO 2 by the atomic layer deposition technique. Capacitance and …
which are deposited on RuO 2 by the atomic layer deposition technique. Capacitance and …
Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
Plasma-enhanced atomic layer deposition (PE-ALD) has many advantages for the
deposition of thin films. However, an appropriate control of the plasma frequency in the PE …
deposition of thin films. However, an appropriate control of the plasma frequency in the PE …
Effect of multiple times pre-sintering on the dielectric properties of TiO2/glass composite
M Wei, J Zhang, J Liu, H Chen, H Chen… - Journal of Materials …, 2017 - Springer
NanoTiO 2/glass composite was potential in pulse power capacitors applications. The glass
addition could deduce the porosity, suppress the grain size and improve the BDS of the …
addition could deduce the porosity, suppress the grain size and improve the BDS of the …