Interplay between oxygen defects and dopants: effect on structure and performance of HfO 2-based ferroelectrics

M Materano, PD Lomenzo, A Kersch… - Inorganic Chemistry …, 2021 - pubs.rsc.org
Ten years after the first report on ferroelectricity in HfO2, researchers are still occupied
unraveling the different causes behind this phenomenon. Among them, oxygen related …

Neuromorphic devices based on fluorite‐structured ferroelectrics

DH Lee, GH Park, SH Kim, JY Park, K Yang… - InfoMat, 2022 - Wiley Online Library
A continuous exponential rise has been observed in the storage and processing of the data
that may not curtail in the foreseeable future. The required data processing speed and …

Low Operating Voltage, Improved Breakdown Tolerance, and High Endurance in Hf0.5Zr0.5O2 Ferroelectric Capacitors Achieved by Thickness Scaling Down to 4 …

K Toprasertpong, K Tahara, Y Hikosaka… - … Applied Materials & …, 2022 - ACS Publications
The comparatively high coercive field in Hf0. 5Zr0. 5O2 (HZO) and other HfO2-based
ferroelectric thin films leads to two critical challenges for their application in embedded …

Ferroelectric HfO2 Memory Transistors With High-κ Interfacial Layer and Write Endurance Exceeding 1010 Cycles

AJ Tan, YH Liao, LC Wang, N Shanker… - IEEE Electron …, 2021 - ieeexplore.ieee.org
We demonstrate ferroelectric (FE) memory transistors on a crystalline silicon channel with
endurance exceeding 10 10 cycles. The ferroelectric transistors (FeFETs) incorporate a high …

The Electrode‐Ferroelectric Interface as the Primary Constraint on Endurance and Retention in HZO‐Based Ferroelectric Capacitors

R Alcala, M Materano, PD Lomenzo… - Advanced Functional …, 2023 - Wiley Online Library
Ferroelectric hafnium‐zirconium oxide is one of the most relevant CMOS‐compatible
materials for next‐generation, non‐volatile memory devices. Nevertheless, performance …

FeFET: A versatile CMOS compatible device with game-changing potential

S Beyer, S Dünkel, M Trentzsch, J Müller… - 2020 IEEE …, 2020 - ieeexplore.ieee.org
With the discovery of ferroelectricity in HfO 2 based thin films and the co-integration of
ferroelectric field effect transistors (FeFET) into standard high-k metal gate (HKMG) CMOS …

Multi-level resistive switching in hafnium-oxide-based devices for neuromorphic computing

M Hellenbrand, J MacManus-Driscoll - Nano Convergence, 2023 - Springer
In the growing area of neuromorphic and in-memory computing, there are multiple reviews
available. Most of them cover a broad range of topics, which naturally comes at the cost of …

A robust high-performance electronic synapse based on epitaxial ferroelectric Hf0. 5Zr0. 5O2 films with uniform polarization and high Curie temperature

Y Wang, Q Wang, J Zhao, T Niermann, Y Liu, L Dai… - Applied Materials …, 2022 - Elsevier
Ferroelectric tunnel junction (FTJ) is a promising emerging memristor for the artificial
synapse in neuro-inspired computing, which has parallel data processing and low power …

Microscopic mechanism of imprint in hafnium oxide-based ferroelectrics

P Yuan, GQ Mao, Y Cheng, KH Xue, Y Zheng, Y Yang… - Nano Research, 2022 - Springer
Hafnia-based ferroelectrics have greatly revived the field of ferroelectric memory (FeRAM),
but certain reliability issues must be satisfactorily resolved before they can be widely applied …

Reliability of HfO2-Based Ferroelectric FETs: A Critical Review of Current and Future Challenges

N Zagni, FM Puglisi, P Pavan… - Proceedings of the …, 2023 - ieeexplore.ieee.org
Ferroelectric transistors (FeFETs) based on doped hafnium oxide (HfO2) have received
much attention due to their technological potential in terms of scalability, high-speed, and …