Capacitance expressions and electrical characterization of tapered through-silicon vias for 3-D ICs

J Su, F Wang, W Zhang - IEEE Transactions on Components …, 2015 - ieeexplore.ieee.org
Closed-form expressions of the parasitic insulator capacitance and the substrate
capacitance for tapered through-silicon vias (T-TSVs) are proposed. The expressions are …

Modeling and application of multi-port TSV networks in 3-D IC

W Yao, S Pan, B Achkir, J Fan… - IEEE Transactions on …, 2013 - ieeexplore.ieee.org
Through-silicon-via (TSV) enables vertical connectivity between stacked chips or interposer
and is a key technology for 3-D integrated circuits (ICs). While arrays of TSVs are needed in …

Numerical laplace inversion method for through-silicon via (TSV) noise coupling in 3D-IC design

K Ait Belaid, H Belahrach, H Ayad - Electronics, 2019 - mdpi.com
Typical 3D integrated circuit structures based on through-silicon vias (TSVs) are complicated
to study and analyze. Therefore, it seems important to find some methods to investigate …

Wideband electromagnetic model and analysis of shielded-pair through-silicon vias

C Liao, Z Zhu, Q Lu, X Liu… - IEEE Transactions on …, 2018 - ieeexplore.ieee.org
The 3-D multistrata integration puts forward high requirements for signal integrity. The
shielded-pair through-silicon vias (SPTSVs) proposed in this paper feature superior …

An improved 100 GHz equivalent circuit model of a through silicon via with substrate current loop

K Kim, K Hwang, S Ahn - IEEE Microwave and Wireless …, 2016 - ieeexplore.ieee.org
This letter presents a new wideband equivalent circuit model for through silicon via (TSV)
with consideration of the effective substrate current loop in silicon substrate and proximity …

[PDF][PDF] Musik, Tanz und Dichtung bei den Kreolen Amerikas

A Friedenthal - 1913 - urresearch.rochester.edu
Ioannis Savidis was born in Rochester, New York in December 1982. He received the BSE
degree in electrical and computer engineering and biomedical engineering from Duke …

An efficient and simple compact modeling approach for 3-D interconnects with IC׳ s stack global electrical context consideration

JE Lorival, F Calmon, F Sun, F Frantz, C Plossu… - Microelectronics …, 2015 - Elsevier
Abstract 3D integration is considered to be the most promising solution to overcome
challenges encountered currently in planar technologies. As an emerging technology …

Capacitance and conductance of through silicon vias with consideration of multilayer media and different shapes

S Liu, W Tang, W Zhuang, G Wang… - IEEE Transactions on …, 2015 - ieeexplore.ieee.org
This paper evaluates the capacitance and conductance of the through silicon vias (TSVs)
with consideration of the multilayer media along the vertical direction and different shapes …

Physical modeling of the capacitance and capacitive coupling noise of through-oxide vias in FDSOI-based ultra-high density 3-D ICs

C Xu, K Banerjee - IEEE transactions on electron devices, 2012 - ieeexplore.ieee.org
Fully depleted silicon-on-insulator (FDSOI) technology boosts the opportunity to make 3-D
ICs with ultrahigh integration density, due to the short and tiny through-oxide vias (TOVs) …

Genetic Algorithms and Particle Swarm Optimization Mechanisms for Through‐Silicon Via (TSV) Noise Coupling

K Ait Belaid, H Belahrach… - … Intelligence and Soft …, 2021 - Wiley Online Library
In this paper, two intelligent methods which are GAs and PSO are used to model noise
coupling in a Three‐Dimensional Integrated Circuit (3D‐IC) based on TSVs. These …