This review paper covers a topic of significant importance in micro-and nano-systems
development and manufacturing, specifically the residual stresses in deposited thin-film …

An etching mechanism for thin silicon dioxide films in hydrofluoric acid solutions has been
deduced from experimental results and a review of literature sources. The etching reaction …

MEMS technology and applications have grown at a tremendous pace, while structural
dimensions have grown smaller and smaller, reaching down even to the molecular level …

We present a pressure sensor based on the piezoresistive effect of graphene. The sensor is
a 100 nm thick, 280 μm wide square silicon nitride membrane with graphene meander …

A new analysis of the deflection of square and rectangular membranes of varying aspect
ratio under the influence of a uniform pressure is presented. The influence of residual …

A set of electrostatically actuated microelectromechanical test structures is presented that
meets the emerging need for microelectromechanical systems (MEMS) process monitoring …

Microelectromechanical systems (MEMS) have recently become an important area of
technology, building on the success of the microelectronics industry over the past 50 years …

A methodology for performing uniaxial compression tests on samples having micron-size
dimensions is presented. Sample fabrication is accomplished using focused ion beam …

The internal stress and Young's modulus of thin films are determined by measuring the
deflection versus pressure of rectangular membranes made of them. In order to reduce the …

Since its first application to thin films in the 1950's the bulge test has become a standard
technique for measuring thin film mechanical properties. While the apparatus required for …