Formation and elimination mechanism of thermal blistering in Al2O3/Si system

S Zhao, G Yuan, D Zhang, P Xu, G Li, W Han - Journal of Materials …, 2021 - Springer
The local delamination of dielectric oxides, manifesting as blistering, is always a puzzle
preventing films from practical applications. In this work, an elaborate study on thermal …

Tribological study of hafnium dioxide and aluminium oxide films grown by atomic layer deposition on glass substrate

R Pietruszka, BS Witkowski, S Zimowski, T Stapinski… - Thin Solid Films, 2020 - Elsevier
In the present work we studied the mechanical properties of hafnium dioxide (HfO 2) and
aluminium oxide (Al 2 O 3) thin films deposited on glass at low temperature by means of …

Impact of doping and silicon substrate resistivity on the blistering of atomic-layer-deposited aluminium oxide

J Ott, TP Pasanen, A Gädda, M Garín, K Rosta… - Applied Surface …, 2020 - Elsevier
Abstract Aluminium oxide (Al 2 O 3) thin films grown at low temperatures using atomic layer
deposition (ALD) are known to often suffer from local delamination sites, referred to as …

Integration of atomic layer deposited aluminum oxide as surface passivation layer into silicon solar cell

S Li - 2023 - aaltodoc.aalto.fi
Increasing the portion of renewable energy in terms of total world energy production is one
of the key factors in solving many environmental and social problems around the world, for …

Low-Temperature, Ultra-Giant Blistering of Atomic Layer Deposited Barrier Coatings on Polyethylene Films Caused by Additive Segregation

JJ Tomán, E Baradács, G Vecsei, L Nagy… - Ultra-Giant Blistering of … - papers.ssrn.com
Low-temperature plasma enhanced atomic layer deposition (PE-ALD) is an advanced
method for coating flexible polyolefin polymers such as low-density polyethylene (LDPE) to …