Ultimate nano-electronics: New materials and device concepts for scaling nano-electronics beyond the Si roadmap

N Collaert, A Alian, H Arimura, G Boccardi… - Microelectronic …, 2015 - Elsevier
In this work, we will give an overview of the innovations in materials and new device
concepts that will be needed to continue Moore's law to the sub-10 nm technology nodes. To …

InGaAs tunnel FET with sub-nanometer EOT and sub-60 mV/dec sub-threshold swing at room temperature

A Alian, Y Mols, CCM Bordallo, D Verreck… - Applied Physics …, 2016 - pubs.aip.org
InGaAs homojunction Tunnel FET devices are demonstrated with sub-60 mV/dec Sub-
threshold Swing (SS) measured in DC. A 54 mV/dec SS is achieved at 100 pA/μm over a …

Capacitive modeling of cylindrical surrounding double-gate MOSFETs for hybrid RF applications

N Gowthaman, VM Srivastava - IEEE Access, 2021 - ieeexplore.ieee.org
The advancements in semiconductor technology greatly impact the growth of hybrid VLSI
devices and components. The nanometer technology has been possibly executed due to the …

Calibration of bulk trap-assisted tunneling and Shockley–Read–Hall currents and impact on InGaAs tunnel-FETs

Q Smets, AS Verhulst, E Simoen… - … on Electron Devices, 2017 - ieeexplore.ieee.org
The tunnel-FET (TFET) is a promising candidate for future low-power logic applications,
because it enables a sub-60-mV/decadesubthresholdswing. However, themost …

An analytical model of gate-all-around heterojunction tunneling FET

Y Guan, Z Li, W Zhang, Y Zhang… - IEEE Transactions on …, 2018 - ieeexplore.ieee.org
A compact analytical drain current model considering the inversion layer and source
depletion is developed for the gate-all-around (GAA) heterojunction tunneling FET (H-TFET) …

Record performance InGaAs homo-junction TFET with superior SS reliability over MOSFET

A Alian, J Franco, A Vandooren, Y Mols… - 2015 IEEE …, 2015 - ieeexplore.ieee.org
InGaAs planar TFETs with 70% In content are fabricated and characterized. The increase of
the In content of the 8 nm channel from 53% to 70% is found to significantly boost the …

Calibration of the effective tunneling bandgap in GaAsSb/InGaAs for improved TFET performance prediction

Q Smets, AS Verhulst, S El Kazzi… - IEEE transactions on …, 2016 - ieeexplore.ieee.org
The effective bandgap for heterojunction band-to-band tunneling (E g, eff) is a crucial design
parameter for a heterojunction tunneling FET (TFET). However, there is significant …

Intrinsic robustness of TFET subthreshold swing to interface and oxide traps: A comparative PBTI study of InGaAs TFETs and MOSFETs

J Franco, AR Alian, A Vandooren… - IEEE Electron …, 2016 - ieeexplore.ieee.org
We study the positive bias temperature instability (PBTI) of InGaAs tunnel-FETs (TFETs) with
two different indium fractions (53% and 70%) and compare with reference MOSFETs, using …

Negative differential resistance in direct bandgap GeSn pin structures

C Schulte-Braucks, D Stange… - Applied physics …, 2015 - pubs.aip.org
Certain GeSn alloys are group IV direct bandgap semiconductors with prospects for
electrical and optoelectronical applications. In this letter, we report on the temperature …

[PDF][PDF] The tunnel field-effect transistor

D Verreck, G Groeseneken… - Wiley Encyclopedia of …, 2016 - lirias.kuleuven.be
The tunnel field-effect transistor (TFET) is a semiconductor device aimed at low-power logic
applications that employs band-to-band tunneling (BTBT) as a carrier injection mechanism …