The nanotechnology revolution of the past decade owes much to the science of lithography,
an umbrella term which encompasses everything from conventional photolithography to …

Photolithographic patterning of organic materials and plasma-based transfer of photoresist
patterns into other materials have been remarkably successful in enabling the production of …

Secondary electrons play critical roles in several imaging technologies, including extreme
ultraviolet (EUV) lithography. At longer wavelengths of light (eg 193 and 248 nm), the …

This review describes the versatile chemistry of photolithographic imaging materials
developed for nanofabrication of semiconductor devices. Conventional photoresists based …

This paper investigates the emission characteristics of a high-performance low-energy (3-kJ)
repetitive dense plasma focus device, NX2, operated at up to 1-Hz repetition rate to develop …

Molecular glass resists are low molecular-weight organic photoresist materials that readily
form stable amorphous glasses above room temperature. We have created new families of …

This paper examines how technological and organisational changes are mediated through
different means of mutually monitoring and collectively coordinating technological …

Photoinduced electron-transfer (PET) reactions represent a powerful methodology with
widespread applications in the fields of organic and synthetic polymer chemistry. Within this …

Described herein are organometallic or inorganic complexes with high extreme ultraviolet
(EUV) optical density (OD) and high mass density for use in thin films. These thin films are …

Ultrahigh loadings of photoacid generators (PAGs) in phenolic extreme ultraviolet (EUV)
resists have generated the highest known film quantum yields (FQYs). We evaluate the …