Photolithographic patterning of organic materials and plasma-based transfer of photoresist
patterns into other materials have been remarkably successful in enabling the production of …

Management of tritium inventory remains one of the grand challenges in the development of
fusion energy, and the choice of plasma-facing materials is a key factor for in-vessel tritium …

Stopping and Range of Ions in Matter (SRIM) is a group of computer programs which
calculate interactions between ions and matter; the core of SRIM is a program called …

SDTrimSP version 7.00 simulates designed for atomic collisions in amorphous targets. It
calculates ranges, reflection coefficients and sputtering yields as well as more detailed …

Featured Application This work finds application in Extreme Ultraviolet (EUV) lithography in
general. More specifically, the results may impact the development of EUV optical …

The roots of mass spectrometry (MS) can be traced to the early 20th century when in the
Cavendish Laboratory at Cambridge University, UK, JJ Thomson performed his first …

We present an electron-cyclotron-resonance plasma source with a biased sample holder
that is well suited for the implantation of deuterium ions into tungsten. Achievable energies …

Extreme UV (EUV) lithography is the most advanced lithography technology for creating the
patterns for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm …

The adsorption of molecular and atomic hydrogen as well as other molecules in the
atmosphere on vacancies in the (0001) graphite surface are investigated using density …

The sputtering of wollastonite (CaSiO 3) by solar wind-relevant ions has been investigated
experimentally and the results are compared to the binary collision approximation (BCA) …