A substrate processing system comprises one or more transfer chambers; a plurality of
process chambers connected to the one or more transfer chambers; and a computing device …

In one embodiment, a method includes receiving measured linescan information describing
a pattern structure of a feature, applying the received measured linescan information to an …

Embodiments of the present disclosure provide a method for predicting an occurrence of a
tool processing event, thereby determining whether to activate a virtual metrology. In a …

In one embodiment, a method includes receiving measured linescan information describing
a pattern structure of a feature, applying the received measured linescan informa-tion to an …

An edge detection system is provided that generates a scanning electron microscope (SEM)
linescan image of a pattern structure including a feature with edges that require detection …