[HTML][HTML] Optimizing phosphorus diffusion for photovoltaic applications: Peak doping, inactive phosphorus, gettering, and contact formation

H Wagner, A Dastgheib-Shirazi, B Min… - Journal of Applied …, 2016 - pubs.aip.org
The phosphosilicate glass (PSG), fabricated by tube furnace diffusion using a POCl 3
source, is widely used as a dopant source in the manufacturing of crystalline silicon solar …

A review of platinum diffusion in silicon and its application for lifetime engineering in power devices

A Johnsson, G Schmidt, M Hauf… - physica status solidi …, 2022 - Wiley Online Library
In silicon power semiconductors, platinum is used to improve the switching characteristics of
the devices by adjusting the lifetime of the minority charge carriers. Platinum diffusion in …

Fission time evolution with excitation energy from a crystal blocking experiment

F Goldenbaum, M Morjean, J Galin, E Lienard, B Lott… - Physical review …, 1999 - APS
Fission times of uraniumlike nuclei with excitation energies up to about 250 MeV have been
inferred from blocking effects in a single crystal. They are found longer by at least 1 order of …

Ring‐Like Defect Formation in N‐Type Czochralski‐Grown Silicon Wafers during Thermal Donor Formation

R Basnet, H Sio, M Siriwardhana… - … status solidi (a), 2021 - Wiley Online Library
This article presents experimental and simulation studies on the formation of recombination‐
active ring‐like defects during thermal donor (TD) formation at 450° C in n‐type Czochralski …

Modeling of dopant diffusion in silicon

ST Dunham, AH Gencer… - IEICE transactions on …, 1999 - search.ieice.org
Recent years have seen great advances in our understanding and modeling of the coupled
diffusion of dopants and defects in silicon during integrated circuit fabrication processes …

Modeling of light-induced degradation due to Cu precipitation in p-type silicon. I. General theory of precipitation under carrier injection

H Vahlman, A Haarahiltunen, W Kwapil… - Journal of Applied …, 2017 - pubs.aip.org
Copper contamination causes minority carrier lifetime degradation in p-type silicon bulk
under illumination, leading to considerable efficiency losses in affected solar cells. Although …

A predictive model for transient enhanced diffusion based on evolution of {311} defects

AH Gencer, ST Dunham - Journal of applied physics, 1997 - pubs.aip.org
It has been observed that {311} defects form, grow, and eventually dissolve during
annealing of Si-implanted silicon wafers. The fact that for subamorphizing silicon implants …

Etching and boron diffusion of high aspect ratio Si trenches for released resonators

JW Weigold, WH Juan, SW Pang - … of Vacuum Science & Technology B …, 1997 - pubs.aip.org
This article discusses etching and boron diffusion in Si for the purpose of fabricating
micromachined devices with high aspect ratio features. The etch rate of Si under various …

A reduced moment-based model for oxygen precipitation in silicon

BC Trzynadlowski, ST Dunham - Journal of Applied Physics, 2013 - pubs.aip.org
A model for the precipitation of oxygen and associated dislocation loops in Czochralski-
grown silicon is presented. Beginning with kinetic rate equations describing the growth and …

Modeling of carbon clustering and associated metal gettering

Y Jin, ST Dunham - ECS Transactions, 2014 - iopscience.iop.org
A moment-based carbon precipitation model is developed based on ab initio calculations of
the energetics of carbon interstitial clusters and silicon carbide precipitates. A metal …