Modeling of NBTI using BAT framework: DC-AC stress-recovery kinetics, material, and process dependence

S Mahapatra, N Parihar - IEEE Transactions on Device and …, 2020 - ieeexplore.ieee.org
Threshold voltage shift (ΔVT) due to Negative Bias Temperature Instability (NBTI) in p-
MOSFETs is modeled using the BTI Analysis Tool (BAT) framework. The ΔV T time kinetics …

Modeling of DC-AC NBTI stress-recovery time kinetics in P-channel planar bulk and FDSOI MOSFETs and FinFETs

N Choudhury, N Parihar, N Goel… - IEEE Journal of the …, 2020 - ieeexplore.ieee.org
The physics-based BTI Analysis Tool (BAT) is used to model the time kinetics of threshold
voltage shift (ΔV T) during and after NBTI in p-channel planar bulk and FDSOI MOSFETs …

Interaction of Negative Bias Instability and Self-Heating Effect on Threshold Voltage and SRAM (Static Random-Access Memory) Stability of Nanosheet Field-Effect …

X Li, Y Shao, Y Wang, F Liu, F Kuang, Y Zhuang, C Li - Micromachines, 2024 - mdpi.com
In this paper, we investigate the effects of negative bias instability (NBTI) and self-heating
effect (SHE) on threshold voltage in NSFETs. To explore accurately the interaction between …

NSFET performance optimization through SiGe channel design-A simulation study

SL Cheng, C Li, XY Dong, SS Lv, HL You - Microelectronics Reliability, 2023 - Elsevier
In this article, NSFET performances including DC electrical characteristics, analog/RF
metrics and NBTI degradation are studied using 3D fully-calibrated TCAD simulation …

Design and Simulation for NBTI Aware Logic Gates

Kajal, VK Sharma - Wireless Personal Communications, 2021 - Springer
Reliability of the electronic circuits is one of the most prominent factor in the development of
very large-scale integration (VLSI) industry. Huge demand for compact size and high …

A physics-based TCAD framework for NBTI

R Tiwari, M Duan, M Bajaj, D Dolgos, L Smith… - Solid-State …, 2023 - Elsevier
A physics-based framework is incorporated in TCAD to model the primary mechanisms
responsible for Negative Bias Temperature Instability (NBTI) in P channel High-K Metal Gate …

A Comprehensive Assessment of Current Trends in Negative Bias Temperature Instability (NBTI) Deterioration

K Singh, S Kalra - 2021 7th International Conference on Signal …, 2021 - ieeexplore.ieee.org
As we move toward ultradeep submicron technology nodes, device aging is getting more
severe. The purpose of this article is to provide an in-depth overview of current optimization …

Hot carrier stress sensing bulk current for 28 nm stacked high-k nMOSFETs

CW Chen, MC Wang, CHT Chang, WL Chu, SP Sung… - Electronics, 2020 - mdpi.com
This work primarily focuses on the degradation degree of bulk current (IB) for 28 nm stacked
high-k (HK) n-channel metal–oxide–semiconductor field-effect transistors (MOSFETs) …

A model for hole trapping-detrapping kinetics during NBTI in p-Channel FETs

N Choudhury, N Parihar, N Goel… - 2020 4th IEEE …, 2020 - ieeexplore.ieee.org
The contribution of hole trapping and detrapping (ΔV_HT) to overall threshold voltage shift
(ΔV_T) during and after Negative Bias Temperature Instability (NBTI) stress is obtained …

Research on the Coupling Effect of NBTI and TID for FDSOI pMOSFETs

H Wei, H Liu, S Wang, S Chen, C Yin, Y Chen, T Gao - Micromachines, 2024 - mdpi.com
The coupling effect of negative bias temperature instability (NBTI) and total ionizing dose
(TID) was investigated by simulation based on the fully depleted silicon on insulator (FDSOI) …