Polarity in GaN and ZnO: Theory, measurement, growth, and devices

J Zuniga-Perez, V Consonni, L Lymperakis… - Applied Physics …, 2016 - pubs.aip.org
The polar nature of the wurtzite crystalline structure of GaN and ZnO results in the existence
of a spontaneous electric polarization within these materials and their associated alloys (Ga …

N-polar GaN: Epitaxy, properties, and device applications

S Mohanty, K Khan, E Ahmadi - Progress in Quantum Electronics, 2023 - Elsevier
Abstract In recent years, Gallium Nitride (GaN) has been established as a material of choice
for high power switching, high power RF and lighting applications. In c-direction, depending …

[HTML][HTML] Epitaxial ScAlN grown by molecular beam epitaxy on GaN and SiC substrates

MT Hardy, BP Downey, N Nepal, DF Storm… - Applied Physics …, 2017 - pubs.aip.org
Sc x Al 1-x N is a promising ultra-wide bandgap material with a variety of potential
applications in electronic, optoelectronic, and acoustoelectric devices related to its large …

Transport properties of polarization-induced 2D electron gases in epitaxial AlScN/GaN heterojunctions

J Casamento, TS Nguyen, Y Cho, C Savant… - Applied Physics …, 2022 - pubs.aip.org
AlScN is attractive as a lattice-matched epitaxial barrier layer for incorporation in GaN high
electron mobility transistors due to its large dielectric constant and polarization. The …

[HTML][HTML] Record high electron mobility and low sheet resistance on scaled-channel N-polar GaN/AlN heterostructures grown on on-axis N-polar GaN substrates by …

S Diez, S Mohanty, C Kurdak, E Ahmadi - Applied Physics Letters, 2020 - pubs.aip.org
GaN-based high electron mobility transistors (HEMTs) have demonstrated high frequency
power amplification with considerably larger output power densities than that available from …

Atomic Layer Deposition as the Enabler for the Metastable Semiconductor InN and Its Alloys

H Pedersen, CW Hsu, N Nepal… - Crystal Growth & …, 2023 - ACS Publications
Indium nitride (InN) is a low-band-gap semiconductor with unusually high electron mobility,
making it suitable for IR-range optoelectronics and high-frequency transistors. However, the …

Epitaxial growth and characterization of AlInN-based core-shell nanowire light emitting diodes operating in the ultraviolet spectrum

RT Velpula, B Jain, MR Philip, HD Nguyen, R Wang… - Scientific reports, 2020 - nature.com
We report the demonstration of the first axial AlInN ultraviolet core-shell nanowire light-
emitting diodes with highly stable emission in the ultraviolet wavelength range. During …

Atom probe tomography of nitride semiconductors

L Rigutti, B Bonef, J Speck, F Tang, RA Oliver - Scripta Materialia, 2018 - Elsevier
Atom probe tomography (APT) has emerged as a valuable tool in the study of nitride
semiconductors, despite the challenges involved in achieving controlled field evaporation. In …

Pure AlN layers in metal-polar AlGaN/AlN/GaN and AlN/GaN heterostructures grown by low-temperature ammonia-based molecular beam epitaxy

SW Kaun, B Mazumder, MN Fireman… - Semiconductor …, 2015 - iopscience.iop.org
When grown at a high temperature (820 C) by ammonia-based molecular beam epitaxy (NH
3-MBE), the AlN layers of metal-polar AlGaN/AlN/GaN heterostructures had a high GaN …

Atom probe tomography on semiconductor devices

MA Khan, SP Ringer, R Zheng - Advanced Materials Interfaces, 2016 - Wiley Online Library
In this paper, state‐of‐the‐art Atom Probe Tomography (APT) on industrial semiconductor
products is reviewed to explore their device physics and to develop an understanding of …