Chemical etching of GaN in KOH solution: role of surface polarity and prior photoetching

JL Weyher, DH Van Dorp, T Conard… - The Journal of …, 2022 - ACS Publications
Surface polarity plays a significant role in chemical etching of GaN in KOH solution, a
process that is important for quality control and device fabrication. In this work, basic …

External Quantum Efficiency Enhancement of InGaN-Based Quantum Dot Green Micro-Light-Emitting Diode Arrays by Fabricating Full-A-Sided Triangular Mesa

P Zhang, Y Gu, Y Gong, H Hua, S Jin, W Yang… - ACS …, 2023 - ACS Publications
Efficient GaN-based green micro light-emitting diodes (micro-LEDs) are critical for novel full-
color displays. In this work, triangular-mesa micro-LED arrays with full-A-side (sample A) …

[HTML][HTML] Impact of crystallographic facet of InGaN micro-LED sidewalls on electro-optical characteristics

A Lex, A Avramescu, F Vögl, M Brandl… - Journal of Applied …, 2024 - pubs.aip.org
InGaN micro-LEDs (⁠ μ LEDs) with their potential high-volume applications have attracted
substantial research interest in the past years. In comparison to other III–V semiconductors …

Tuning of quasi-vertical GaN FinFETs fabricated on SiC substrates

P Gribisch, RD Carrascon… - IEEE Transactions on …, 2023 - ieeexplore.ieee.org
In this work, we present the fabrication and investigation of the properties of quasi-vertical
gallium nitride (GaN) fin field effect transistors (FinFETs) on silicon carbide (SiC) substrates …

[HTML][HTML] Direct observation of radio-frequency negative differential resistance in GaN-based single drift region IMPATT diodes

Z Zhu, L Cao, A Jönsson, P Xu, J Xie, P Fay - Applied Physics Letters, 2024 - pubs.aip.org
We report the direct observation of radio-frequency negative differential resistance, via on-
wafer S-parameter measurements, in GaN-based impact ionization avalanche transit time …

A route for the top-down fabrication of ordered ultrathin GaN nanowires

M Oliva, V Kaganer, M Pudelski, S Meister… - …, 2023 - iopscience.iop.org
We introduce a facile route for the top-down fabrication of ordered arrays of GaN nanowires
with aspect ratios exceeding 10 and diameters below 20 nm. Highly uniform thin GaN …

Preferential crystal orientation etching of GaN nanopillars in Cl2 plasma

L Jaloustre, V Ackermann, SS De Mello… - Materials Science in …, 2023 - Elsevier
The ability to fabricate organized, dense arrays of GaN nanostructures with high aspect
ratios is of great interest for improving light extraction and absorption in optoelectronic …

InGaN laser diodes with etched facets for photonic integrated circuit applications

K Gibasiewicz, A Kafar, D Schiavon, K Saba, Ł Marona… - Micromachines, 2023 - mdpi.com
The main objective of this work is to demonstrate and validate the feasibility of fabricating
(Al, In) GaN laser diodes with etched facets. The facets are fabricated using a two-step dry …

Reduction of the lasing threshold in optically pumped AlGaN/GaN lasers with two-step etched facets

S Cuesta, L Denaix, F Castioni, LS Dang… - Semiconductor …, 2022 - iopscience.iop.org
We report a two-step process to obtain smooth and vertical {10− 10} m-plane facets in
AlGaN/GaN separate confinement heterostructures designed to fabricate ultraviolet lasers …

Scaling study on high-current density low-dispersion GaN vertical FinFETs

S Jeong, K Lee, J Chun, R Soman… - IEEE Electron Device …, 2023 - ieeexplore.ieee.org
GaN vertical FinFETs on a bulk GaN substrate were fabricated with various fin widths and
400 ns pulsed IV measurements were performed to investigate their self-heating and DC-RF …