Structure and optical properties of HfO2 thin films on silicon after rapid thermal annealing
T Tan, Z Liu, H Lu, W Liu, H Tian - Optical Materials, 2010 - Elsevier
HfO2 thin films have been deposited on Si substrate by radio frequency reactive magnetron
sputtering. The optical and structural properties of HfO2 thin films in relation to rapid thermal …
sputtering. The optical and structural properties of HfO2 thin films in relation to rapid thermal …
Electrochemical deposition and characterization of copper-cobalt oxide layers by electrodeposition
The copper-cobalt oxide (Cu 2 CoO 3) was successfully elaborated on indium tin oxide (ITO)
substrate using the co-electrodeposition method in citric acid (C 6 H 8 O 7) solution at a …
substrate using the co-electrodeposition method in citric acid (C 6 H 8 O 7) solution at a …
Optical properties of hafnium-dioxide derived from reflection electron energy loss spectroscopy spectra
The optical properties of HfO 2 have practical applications. As an important gate dielectric
material with high-k dielectric, HfO 2 is beneficial to reduce the leakage current of the …
material with high-k dielectric, HfO 2 is beneficial to reduce the leakage current of the …
Low-temperature solution-processed ZrO2 gate insulators for thin-film transistors using high-pressure annealing
A solution-processed ZrO 2 gate insulator was fabricated using high-pressure annealing
(HPA). The dehydroxylation process was accelerated and a thin, dense ZrO 2 film was …
(HPA). The dehydroxylation process was accelerated and a thin, dense ZrO 2 film was …
Thermal stability of high-k Si-rich HfO2 layers grown by RF magnetron sputtering
L Khomenkova, X Portier, J Cardin… - Nanotechnology, 2010 - iopscience.iop.org
The microstructure and optical properties of HfSiO films fabricated by RF magnetron
sputtering were studied by means of x-ray diffraction, transmission electron microscopy …
sputtering were studied by means of x-ray diffraction, transmission electron microscopy …
Optical characterization of HfO2 thin films
D Franta, I Ohlídal, D Nečas, F Vižd'a, O Caha… - Thin Solid Films, 2011 - Elsevier
Hafnia films prepared onto silicon wafers at three substrate temperatures of 40, 160 and
280° C are optically characterized utilizing the multi-sample method. The characterization …
280° C are optically characterized utilizing the multi-sample method. The characterization …
Effect of applied potential on the optical and electrical properties of Cu2CoO3
The effect of the applied potential on the crystallography, morphology, optical, and electrical
properties of copper–cobalt oxide (Cu2CoO3) co-electrodeposited on ITO (Indium Tin …
properties of copper–cobalt oxide (Cu2CoO3) co-electrodeposited on ITO (Indium Tin …
Ultra-low subthreshold swing in oxide TFTs via HiPIMS high-k HfO2 gate dielectric using atmosphere annealing
MJ Zhao, YT Wang, JH Yan, HC Li, H Xu, DS Wuu… - Applied Surface …, 2025 - Elsevier
High-k hafnium oxide (HfO 2) thin films prepared by high-power impulse magnetron
sputtering were annealed in different atmospheres including vacuum, nitrogen (N 2) and …
sputtering were annealed in different atmospheres including vacuum, nitrogen (N 2) and …
Heterostructure Films of SiO2 and HfO2 for High-Power Laser Optics Prepared by Plasma-Enhanced Atomic Layer Deposition
Absorption losses and laser-induced damage threshold (LIDT) are considered to be the
major constraints for development of optical coatings for high-power laser optics. Such …
major constraints for development of optical coatings for high-power laser optics. Such …
Intercomparison between optical and x-ray scatterometry measurements of FinFET structures
In this paper, we present a comparison of profile measurements of vertical field effect
transistor (FinFET) fin arrays by optical critical dimension (OCD) metrology and critical …
transistor (FinFET) fin arrays by optical critical dimension (OCD) metrology and critical …