Spectral purity systems applied for laser-produced plasma extreme ultraviolet lithography sources: a review
N Lin, Y Chen, X Wei, W Yang, Y Leng - High Power Laser Science …, 2023 - cambridge.org
With the development of high-volume manufacturing for very-large-scale integrated circuits,
the purity of the light source in the extreme ultraviolet lithography (EUVL) system needs to …
the purity of the light source in the extreme ultraviolet lithography (EUVL) system needs to …
High-power EUV lithography: spectral purity and imaging performance
M van de Kerkhof, F Liu, M Meeuwissen… - Journal of micro …, 2020 - spiedigitallibrary.org
With the introduction of the NXE: 3400B scanner, ASML has brought extreme ultraviolet
lithography (EUV) to high-volume manufacturing (HVM). The high-EUV power of> 200 W …
lithography (EUV) to high-volume manufacturing (HVM). The high-EUV power of> 200 W …
Spectral purity performance of high-power EUV systems
M van de Kerkhof, F Liu, M Meeuwissen… - Extreme Ultraviolet …, 2020 - spiedigitallibrary.org
With the introduction of the NXE: 3400B scanner, ASML has brought EUV to High-Volume
Manufacturing (HVM). The high EUV power of> 200W being realized with this system …
Manufacturing (HVM). The high EUV power of> 200W being realized with this system …